2006
DOI: 10.1016/j.cplett.2005.10.112
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Effect of stoichiometry and microstructure on hydrolysis in MoO3 films

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Cited by 11 publications
(16 citation statements)
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“…The widening of the region below 400 nm corresponds to the ZnO and MoO 3 absorption region. 60 The latter indicates that the ambient atmosphere is modifying the properties of these oxides, in agreement with the sensitivity towards humidity known for several semiconductor oxides, 47,50 among which are MoO 3 49,51 and ZnO. 48 The shift observed for the maximum IPCE peak shown in Fig.…”
Section: Un-encapsulated Devices: Nrel and Imecsupporting
confidence: 82%
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“…The widening of the region below 400 nm corresponds to the ZnO and MoO 3 absorption region. 60 The latter indicates that the ambient atmosphere is modifying the properties of these oxides, in agreement with the sensitivity towards humidity known for several semiconductor oxides, 47,50 among which are MoO 3 49,51 and ZnO. 48 The shift observed for the maximum IPCE peak shown in Fig.…”
Section: Un-encapsulated Devices: Nrel and Imecsupporting
confidence: 82%
“…44 It has also been related to the formation of pinholes and the catastrophic failure of J sc observed in inverted OPVs analyzed in air leading to the reduction of device lifetime. 45,46 Although semiconductor oxides like ZnO or MoO 3 are also known to be sensitive to moisture, [47][48][49][50][51] the MoO 3 layer has shown to be much more stable to humidity than the PEDOT polymer [44][45][46]52,53 and reports on the improvement of device lifetime can already be found in the literature when the MoO 3 layer is used instead of PEDOT:PSS. 54 All the aforementioned detrimental effects on OPVs observed when PEDOT:PSS is applied have also been observed for the NREL devices analyzed in this collaborative work as already reported.…”
Section: Un-encapsulated Devices: Nrel and Imecmentioning
confidence: 99%
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“…These observations are consistent with the findings of Reddy et al [54] who studied MoO x films of different microstructures and stoichiometries exposed to ambient air humidity, by infrared spectroscopy. They reported that amorphous, nearly stoichiometric MoO x films (x&3) contain the largest amount of hydrolyzed Mo-OH bonds.…”
Section: Stability Of Moo X Layers and Dmd Electrodessupporting
confidence: 92%
“…This is explained by the acid-base mechanism, where the electron lone pairs of OH -(arising from H 2 O dissociation) must be transferred to the 4d vacant orbitals of Mo. In nonstoichiometric films, 4d orbitals are partially filled, impeding the electron transfer, i.e., the growth of hydrolyzed bonds is slowed down [54]. Interestingly, highly stoichiometric but polycrystalline films did not show hydrolyzed bonds.…”
Section: Stability Of Moo X Layers and Dmd Electrodesmentioning
confidence: 99%