2024
DOI: 10.1016/j.eurpolymj.2023.112636
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Effect of substituents on the performance of N-carbazolyl double benzylidene ketones in visible/NIR light one/two-photon polymerization

Jie Xie,
Xiaobing Wang,
Yonghui Wang
et al.
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Cited by 2 publications
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“…Recently, such PIs containing heterocycles/heteroatoms have also been used in the field of nanotechnology, especially for two-photon lithography. Two-photon lithography is an additive manufacturing technology based on two-photon polymerization (TPP), leveraging nonlinear and super-resolution concepts to achieve precise 3D printing with a single tightly focused laser beam . This method shows application potential in various fields such as microrobotics, biomaterials, and tissue engineering. The commercial two-photon PI DETC (7-diethylamino-3-thienylcoumarin), which contains thiophene, has been commonly used in TPP. , Cao et al designed and synthesized a series of heteroatom-substituted ketocoumarins as PIs, and these compounds exhibit high sensitivity in two-photon lithography, which allows for the fabrication of complex three-dimensional patterns at writing speeds of up to 60 mm s –1 .…”
Section: Introductionmentioning
confidence: 99%
“…Recently, such PIs containing heterocycles/heteroatoms have also been used in the field of nanotechnology, especially for two-photon lithography. Two-photon lithography is an additive manufacturing technology based on two-photon polymerization (TPP), leveraging nonlinear and super-resolution concepts to achieve precise 3D printing with a single tightly focused laser beam . This method shows application potential in various fields such as microrobotics, biomaterials, and tissue engineering. The commercial two-photon PI DETC (7-diethylamino-3-thienylcoumarin), which contains thiophene, has been commonly used in TPP. , Cao et al designed and synthesized a series of heteroatom-substituted ketocoumarins as PIs, and these compounds exhibit high sensitivity in two-photon lithography, which allows for the fabrication of complex three-dimensional patterns at writing speeds of up to 60 mm s –1 .…”
Section: Introductionmentioning
confidence: 99%