Effect of substrate roughness on growth of diamond by hot filament CVD

Mallik, Asok K.; Binu, S R; Satapathy, L. N.; Narayana, Chandrabhas; Seikh, Md. Motin; Shivashankar, S. A.; Biswas, Sushanta

doi:10.1007/s12034-010-0039-3

Cited by 14 publications

(4 citation statements)

References 22 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…CVD diamond grows between 700 ℃ and 1100 ℃ at sub-atmospheric pressure of 20-130 Torr; to deposit high-quality diamond with well-faceted morphology, the substrate temperature has to be on the higher side of 900 ℃, whereas substrate temperature lower than 700 ℃ produces cauliflower nanocrystalline morphology [31][32][33][34]. The growth rate initially increases with temperature, and after attaining maximum slowly decreases down.…”

Section: Introductionmentioning

confidence: 99%

Property mapping of polycrystalline diamond coatings over large area

et al. 2014

View full text Add to dashboard Cite

Large-area polycrystalline diamond (PCD) coatings are important for fields such as thermal management, optical windows, tribological moving mechanical assemblies, harsh chemical environments, biological sensors, etc. Microwave plasma chemical vapor deposition (MPCVD) is a standard technique to grow high-quality PCD films over large area due to the absence of contact between the reactive species and the filament or the chamber wall. However, the existence of temperature gradients during growth may compromise the desired uniformity of the final diamond coatings. In the present work, a thick PCD coating was deposited on a 100-mm silicon substrate inside a 915-MHz reactor; the temperature gradient resulted in a non-uniform diamond coating. An attempt was made to relate the local temperature variation during deposition and the different properties of the final coating. It was found that there was large instability inside the system, in terms of substrate temperature (as high as ΔT = 212 ℃), that resulted in a large dispersion of the diamond coating's final properties: residual stress (15.8 GPa to +6.2 GPa), surface morphology (octahedral pyramids with (111) planes to cubo-octahedrals with (100) flat top surfaces), thickness (190 µm to 245 µm), columnar growth of diamond (with appearance of variety of nanostructures), nucleation side hardness (17 GPa to 48 GPa), quality (Raman peak FWHM varying from 5.1 cm 1 to 12.4 cm 1 with occasional splitting). This random variation in properties over large-area PCD coating may hamper reproducible diamond growth for any meaningful technological application.

show abstract

Section: Introductionmentioning

confidence: 99%

Property mapping of polycrystalline diamond coatings over large area

et al. 2014

View full text Add to dashboard Cite

show abstract

“…It should be noted that the low roughness values achieved can be applied to create smoother interfaces for optical, tribological, thermal, and biomedical applications. The morphology differences between the growth on Si and stainless steel substrates can be due to the increased surface roughness of the stainless steel substrate. , It was found that increasing the substrate roughness leads to a more faceted growth, whereas smoother substrates produced a rounder, cauliflower-like morphology.…”

Section: Resultsmentioning

confidence: 99%

“…The morphology differences between the growth on Si and stainless steel substrates can be due to the increased surface roughness of the stainless steel substrate. 45,46 It was found that increasing the substrate roughness leads to a more faceted growth, whereas smoother substrates produced a rounder, cauliflower-like morphology. Finally, we demonstrate that the FVD system allows for facile addition of external electric fields to further control the growth of NCD films.…”

Section: Resultsmentioning

confidence: 99%

Atmospheric-Pressure Flame Vapor Deposition of Nanocrystalline Diamonds: Implications for Scalable and Cost-Effective Coatings

Manjarrez

Zhou

Chen

et al. 2022

ACS Appl. Nano Mater.

View full text Add to dashboard Cite

Nanocrystalline diamonds (NCDs) are one of the many carbon allotropes that have attracted great attention for the advancement of many technologies owing to their superior mechanical, thermal, and optical properties. Yet, their synthesis must be improved for availability at low costs and their widespread application. Here, we report the atmospheric-pressure flame vapor deposition (FVD) synthesis of NCD particles and thin films over an area of more than 27 cm2 using methane–hydrogen–air flat flames. Synthesis at atmospheric pressure is beneficial as it can lower costs and be more time-efficient when compared to the batch-by-batch synthesis of low-pressure and high-pressure processes. Also, the abundance of methane gas available can further lower costs and improve scalability, while generating lower flame temperatures to mitigate the need of extensive cooling. Notably, the FVD method unlocks conditions for diamond growth beyond the previously considered diamond-growth region of the C–H–O phase diagram. By modeling the flame radical species as a guidance, we experimentally demonstrate that the FVD growth of NCDs can be facilely controlled by tuning the reactant gas composition, substrate material, and seeding density. Moreover, we show that the addition of an external electric bias was influential in controlling the porosity and thickness of the NCD films. Overall, with the low cost and simplicity for operation without the need of vacuum, this atmospheric-pressure FVD approach will offer opportunities to facilitate the scaling-up of NCD synthesis for applications in optical, tribological, thermal, and biomedical coatings.

show abstract

“…† Corresponding author: nagasaka.hiroshi@iri-tokyo.jp activation of gases is the first step in the diamond thinfilm growth. The growth of diamond films is dependent on many parameters [4][5][6][7][8][9][10], such as filament temperature, substrate temperature, substrate material, and reactant gas mixture.…”

Section: Introductionmentioning

confidence: 99%

Growth Rate and Electrochemical Properties of Boron-Doped Diamond Films Prepared by Hot-Filament Chemical Vapor Deposition Methods

Nagasaka

Teranishi

Kondo

et al. 2016

e-J. Surf. Sci. Nanotech.

View full text Add to dashboard Cite

Boron-doped diamond (BDD) films have good electrochemical performance with a wide potential window and chemical stability in aqueous solutions, compared with other electrode materials made of Pt, glassy carbon, and so forth. BDD electrodes have been investigated for various industrial applications, such as ozone-dissolved water and effluent water treatment. In this study, to achieve a high synthesis rate of BDD films, trimethyl borate was additionally introduced to a hot-filament chemical vapor deposition (HF-CVD) system as a reactant gas. It was found that the growth rate and quality of diamond prepared using the HF-CVD system depended on the effect of CH4 concentration on hydrogen, distance from filament to substrate, and supply B/C ratios. BDD films with a high growth rate in the range from 2 to 4 µm/h have been obtained at a filament-to-substrate distance of 5 mm, a CH4 concentration of 4%, and B/C ratios of 0.3-2.0%. Cyclic voltammograms of a Pt and BDD electrodes in 0.2 M KNO3 have been investigated in terms of the effect of supply B/C ratios of 0.3, 0.5, and 2.0%. It was found that BDD electrodes had a wide potential window and a low background current compared with conventional Pt electrodes. The BDD films prepared and characterized in this study are efficient as electrodes for environmental applications.

show abstract

Effect of substrate roughness on growth of diamond by hot filament CVD

Cited by 14 publications

References 22 publications

Property mapping of polycrystalline diamond coatings over large area

Property mapping of polycrystalline diamond coatings over large area

Atmospheric-Pressure Flame Vapor Deposition of Nanocrystalline Diamonds: Implications for Scalable and Cost-Effective Coatings

Growth Rate and Electrochemical Properties of Boron-Doped Diamond Films Prepared by Hot-Filament Chemical Vapor Deposition Methods

Contact Info

Product

Resources

About