2020
DOI: 10.29292/jics.v10i1.403
|View full text |Cite
|
Sign up to set email alerts
|

Effect of substrate type on structure of TiO2 thin film deposited by atomic layer deposition technique

Abstract: This paper discusses about the effect of substrate type on structure of titanium dioxide thin film deposited by atomic layer deposition technique using titanium tetrachloride and deionized water as precursors. The substrates investigated are silicon (100), cover glass and titanium, and the depositions were performed at temperatures ranging from 300ºC to 450 ºC. We observed through Rutherford backscattering spectrometry that the TiO2 thin films grown on both substrates are stoichiometric. Grazing incidence x-ra… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1
1

Citation Types

1
4
0

Year Published

2021
2021
2024
2024

Publication Types

Select...
6
2
1

Relationship

0
9

Authors

Journals

citations
Cited by 18 publications
(5 citation statements)
references
References 23 publications
1
4
0
Order By: Relevance
“…The ALD of metal oxide thin films yields varying results across different substrates, as demonstrated in our research on ALD TiO2 [20]. This observation holds true for Al2O3 deposited on both planar silicon and CFFs.…”
Section: Ald Alxoy Film Growth: Comparative Analysis On Silicon and C...supporting
confidence: 59%
“…The ALD of metal oxide thin films yields varying results across different substrates, as demonstrated in our research on ALD TiO2 [20]. This observation holds true for Al2O3 deposited on both planar silicon and CFFs.…”
Section: Ald Alxoy Film Growth: Comparative Analysis On Silicon and C...supporting
confidence: 59%
“…2 (a) shows a typical RBS spectrum corresponding to the 1000-cycles film deposited at 200 • C along with and the fit curve. It exhibits well-defined peaks of Ti and O above the Si wafer contribution [8,66] and no carbon is detected. The fitting of the experimental data indicates that TiO 2 films deposited at all T D are stoichiometric.…”
Section: Structural Propertiesmentioning
confidence: 99%
“…The GIXRD patterns of the four coated substrates exhibited two prominent peaks at 24.9° and 47.1°, which corresponded to the (101) and (200) planes of anatase TiO 2 [24,25]. In contrast, these two peaks were not detected in the uncoated substrates (Figure 3(a and b)).…”
Section: Resultsmentioning
confidence: 99%