2006
DOI: 10.1149/1.2203239
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Effect of Surface Reactive Site Density and Reactivity on the Growth of Atomic Layer Deposited WN[sub x]C[sub y] Films

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Cited by 9 publications
(4 citation statements)
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“…Due to the low concentration of hydroxyl groups on Cu and Al substrates, direct deposition of SOCAL was unsuccessful. Therefore, the SOCAL was coated on top of the sol–gel coating with SiO 2 acting as an intermediate layer between the substrate and SOCAL. ,, The detailed process of SOCAL development is explained elsewhere. , Briefly, we started by making a 100:10:1 wt % mixture of isopropanol: dimethyldimethoxysilane (DMDMS, CAS#: 1112-39-6, Sigma-Aldrich): sulfuric acid (CAS#: 7664-93-9, Sigma-Aldrich). After stirring the solution for 30 s, the mixture was left to rest in a sealed glass container for 20 min at room temperature.…”
Section: Methodsmentioning
confidence: 99%
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“…Due to the low concentration of hydroxyl groups on Cu and Al substrates, direct deposition of SOCAL was unsuccessful. Therefore, the SOCAL was coated on top of the sol–gel coating with SiO 2 acting as an intermediate layer between the substrate and SOCAL. ,, The detailed process of SOCAL development is explained elsewhere. , Briefly, we started by making a 100:10:1 wt % mixture of isopropanol: dimethyldimethoxysilane (DMDMS, CAS#: 1112-39-6, Sigma-Aldrich): sulfuric acid (CAS#: 7664-93-9, Sigma-Aldrich). After stirring the solution for 30 s, the mixture was left to rest in a sealed glass container for 20 min at room temperature.…”
Section: Methodsmentioning
confidence: 99%
“…Therefore, the SOCAL was coated on top of the sol−gel coating with SiO 2 acting as an intermediate layer between the substrate and SOCAL. 21,25,26 The detailed process of SOCAL development is explained elsewhere. 21,24 Briefly, we started by making a 100:10:1 wt % mixture of isopropanol: dimethyldimethoxysilane (DMDMS, CAS#: 1112-39-6, Sigma-Aldrich): sulfuric acid (CAS#: 7664-93-9, Sigma-Aldrich).…”
Section: ■ Methodsmentioning
confidence: 99%
“…This difference is also responsible for the varying volatile organic compound dynamics that different metal oxides display. , Indeed, the main factors to influence surface modification are the concentration of surface hydroxyl groups, the type of surface hydroxyl groups present at the interface, the hydrolytic stability of the bond formed between the groups and the SOCAL molecules, and geometry and physical dimensions of the substrate . Hydroxyl-containing substrates vary widely in concentration and type of hydroxyl groups present, with glass or silica being two of the best substrate materials for surface modification in comparison to Al. Given this result, we deposit SiO 2 on Al substrates prior to SOCAL coating. This forms a sandwich structure with three layers (Al–SiO 2 –SOCAL); the SiO 2 layer is deposited by different methods.…”
Section: Methodsmentioning
confidence: 99%
“…(We see it as slightly ironic that DEZ is used as a source of ethyl groups in organic chemistry, but for zinc in ALD.) In an ALD process, the early stages of film formation, termed the transient regime, may be nonlinear, involving three-dimensional growth that depends on substrate reactivity, i.e., the growth in this regime is highly dependent on the functional groups at the surface [60][61]. In this work, dehydrated, fused silica surfaces with different densities of silanol groups were tagged with Al and Zn.…”
Section: Introductionmentioning
confidence: 99%