1997
DOI: 10.1063/1.363913
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Effect of surface treatment on an n-CdSe0.6Te0.4 thin-film photoanode/polysulphide electrolyte solar cell

Abstract: Polycrystalline thin films of n-CdSe0.6Te0.4 were deposited in a vacuum of 5×10−5 Torr by thermal flash evaporation with a deposition rate of 20±1 Å/s on indium oxide coated glass plates [σ=1.25×104 (Ω cm)−1] held at 200 °C. Application of surface treatment techniques such as annealing and photoelectrochemical etching on the films revealed that the films exhibit photoelectrochemical behavior with increased conversion efficiency and stability after treatment. Gärtner’s model [Phys. Rev. 116, 84 (1954)] was used… Show more

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Cited by 42 publications
(4 citation statements)
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“…The large grain size leads to the reduction of the grain boundary area of thin films with important consequences for efficient energy conversion. The low resistivity of the photoelectrode is required to minimize the series resistance of the cell [9]. Photoconducting antimony trisulfide thin films are generally prepared by vacuum evaporation or by a sintering technique using powdered Sb 2 S 3 as the starting material [10,11].…”
Section: Introductionmentioning
confidence: 99%
“…The large grain size leads to the reduction of the grain boundary area of thin films with important consequences for efficient energy conversion. The low resistivity of the photoelectrode is required to minimize the series resistance of the cell [9]. Photoconducting antimony trisulfide thin films are generally prepared by vacuum evaporation or by a sintering technique using powdered Sb 2 S 3 as the starting material [10,11].…”
Section: Introductionmentioning
confidence: 99%
“…4 shows the J-V characteristics of the solar cell modeled using SCAPS. The fill factor (FF) and efficiency () of Al:ZnO/Si solar cell are calculated from relations (3) and ( 4), respectively [13,14]:…”
Section: Methodsmentioning
confidence: 99%
“…Presently, one of the best materials for tailoring of band gaps is from the group of Cd-chalcogenide [15,16].…”
Section: Introductionmentioning
confidence: 99%