2021
DOI: 10.1109/ted.2021.3100005
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Effect of the Si Doping Content in HfO2 Film on the Key Performance Metrics of Ferroelectric FETs

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Cited by 9 publications
(6 citation statements)
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“…Therefore, hereafter, potentiation/depression is mainly used regardless of the overall neural system type (ANN or SNN). Although linear potentiation/depression using identical pulses is possible, achieving linear potentiation/depression using identical pulses has rarely been reported in ferroelectric materials 75,76 . This can be understood from the general polarization switching mechanism in ferroelectric materials, which can be modeled by the Komologorov–Avrami–Ishibashi (KAI) or NLS models based on domain wall propagation described by the well‐known Merz's law 77–82 .…”
Section: Advantages and Challenges Of Fluorite‐structured Ferroelectr...mentioning
confidence: 99%
See 3 more Smart Citations
“…Therefore, hereafter, potentiation/depression is mainly used regardless of the overall neural system type (ANN or SNN). Although linear potentiation/depression using identical pulses is possible, achieving linear potentiation/depression using identical pulses has rarely been reported in ferroelectric materials 75,76 . This can be understood from the general polarization switching mechanism in ferroelectric materials, which can be modeled by the Komologorov–Avrami–Ishibashi (KAI) or NLS models based on domain wall propagation described by the well‐known Merz's law 77–82 .…”
Section: Advantages and Challenges Of Fluorite‐structured Ferroelectr...mentioning
confidence: 99%
“…Another approach to achieve gradual polarization switching has been experimentally demonstrated. By increasing the Si doping content in HfO 2 , the fraction of non‐FE phase increases, which induces inhomogeneity in the E c distribution and enhances polarization switching dispersion in the ferroelectric layer 76 . Similarly, further studies regarding critical nuclei size in fluorite‐structured ferroelectrics are required for increasing the number of ferroelectric domains under same gate size.…”
Section: Neuromorphic Computing Systems Based On Fluorite‐structured ...mentioning
confidence: 99%
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“…Recently, another way to influence the number of intermediate levels has been experimentally verified and builds upon changing the doping content in the FE layer [63]. Figures 4(a)-(c) show that by increasing the Si doping in HfO 2 , the switching transition becomes less steep and the number of intermediate V T states increases, although the same write pulsing scheme is used.…”
Section: Fefet As a Synapsementioning
confidence: 99%