2022
DOI: 10.1021/acsami.2c03471
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Effect of the Substrate on MoS2 Monolayer Morphology: An Integrated Computational and Experimental Study

Abstract: Synthesis of two-dimensional materials, specifically transition metal dichalcogenides (TMDs), with controlled lattice orientations is a major barrier to their industrial applications. Controlling the orientation of as-grown TMDs is critical for preventing the formation of grain boundaries, thus reaching their maximum mechanical and optoelectronic performance. Here, we investigated the role of the substrate’s crystallinity in the growth orientation of 2D materials using reactive molecular dynamics (MD) simulati… Show more

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Cited by 19 publications
(14 citation statements)
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“…Previously described synthesis protocols were used to prepare redox-exfoliated MoS 2 , and MOCVD MoS 2 . , H-bn flakes in solution were purchased from 2D Semiconductors. Solution phase samples were drop cast onto a glass coverslip for measurement.…”
Section: Methodsmentioning
confidence: 99%
“…Previously described synthesis protocols were used to prepare redox-exfoliated MoS 2 , and MOCVD MoS 2 . , H-bn flakes in solution were purchased from 2D Semiconductors. Solution phase samples were drop cast onto a glass coverslip for measurement.…”
Section: Methodsmentioning
confidence: 99%
“…4h and i). 69 Kinetic Monte Carlo (KMC) simulation method has also been used to model the dynamic evolution of TMDs with respect to the substrate. Nie et al used KMC to study the van der Waals epitaxy process of TMDs and discussed how the growth parameters affect the uniform nucleation, growth rate, domain shape and thickness.…”
Section: Rðoþmentioning
confidence: 99%
“…Efficient computational tools have been developed to perform simulations within timespans not accessible to experimental studies [ 22 , 23 ]. We may refer to large-scale continuum simulations [ 24 , 25 , 26 , 27 , 28 , 29 , 30 , 31 , 32 , 33 , 34 , 35 , 36 , 37 , 38 , 39 , 40 , 41 , 42 , 43 , 44 , 45 , 46 , 47 ], phase-field simulations for capturing the microstructure [ 48 , 49 , 50 , 51 , 52 , 53 , 54 , 55 ], MD simulations to capture the atomistic mechanisms [ 2 , 47 , 56 , 57 , 58 , 59 , 60 , 61 , 62 , 63 , 64 , 65 , 66 , 67 ], and multiscale simulations to capture the broad spectrum of materials and processes response [ 24 , 25 , 46 ,…”
Section: Introductionmentioning
confidence: 99%