Effect of Ti Transition Layer Thickness on the Structure, Mechanical and Adhesion Properties of Ti-DLC Coatings on Aluminum Alloys

Cao, Hongshuai; Qi, Fugang; Ouyang, Xiaoping; Nie, Zhaogang; Zhou, Yun; Li, Beibei; Luo, Wenzhong; Liao, Bin; Luo, Jianbin

doi:10.3390/ma11091742

Cited by 52 publications

(20 citation statements)

References 42 publications

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“…5 b) [38,40] that are useful to predict the wear behavior and toughness characteristics of coatings, respectively. The minimum values of H/E = 0.0213 and H 3 /E 2 = 0.0028 GPa were obtained for the coating deposited at low nitrogen flow rate of 5 %, indicating a low plasticity index and a poor resistance to plastic deformation, in agreement with other studies on Ti-N films [41,42].…”

Section: Nanoindentation Measurementssupporting

confidence: 91%

Relationship between structure, surface topography and tribo-mechanical behavior of Ti-N thin films elaborated at different N2 flow rates

et al. 2021

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HAL is a multi-disciplinary open access archive for the deposit and dissemination of scientific research documents, whether they are published or not. The documents may come from teaching and research institutions in France or abroad, or from public or private research centers. L'archive ouverte pluridisciplinaire HAL, est destinée au dépôt et à la diffusion de documents scientifiques de niveau recherche, publiés ou non, émanant des établissements d'enseignement et de recherche français ou étrangers, des laboratoires publics ou privés.

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Section: Nanoindentation Measurementssupporting

confidence: 91%

Relationship between structure, surface topography and tribo-mechanical behavior of Ti-N thin films elaborated at different N2 flow rates

et al. 2021

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“…Hence, a-C:B is composed of a sp 2 carbon cluster and sp 3 carbon matrix. With Raman results, the I D /I G represents a proportion of sp 2 /sp 3 [25], and the I D /I G is not changed with increasing the pressure from 1 to 2 Pa; however, the E opt is reduced from 3.19 eV to 3.08 eV. The reason for this may be that, although a higher working pressure, i.e., 2.0 Pa, can’t supply enough energy to induce the reaction between boron and carbon atoms, it may shape the size or vary the arrangement of sp 2 clusters, which may narrow the hopping distance between two sp 2 clusters.…”

Section: Resultsmentioning

confidence: 99%

Modulating Band Gap of Boron Doping in Amorphous Carbon Nano-Film

Zhu

Lian

et al. 2019

Materials

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Amorphous carbon (a-C) films are attracting considerable attention to due their large optical band gap (Eopt) range of 1–4 eV. But the hopping conducting mechanism of boron doping a-C (a-C:B) is still mysterious. To exploring the intrinsic reasons behind the semiconductor properties of a-C:B, in this work, the boron doping a-C (a-C:B) nano-film was prepared, and the growth rate and Eopt changing were analyzed by controlling the different experimental conditions of magnetron sputtering. A rapid deposition rate of 10.55 nm/min was obtained. The Eopt is reduced from 3.19 eV to 2.78 eV by improving the substrate temperature and sputtering power. The proportion of sp2/sp3 increasing was uncovered with narrowing the Eopt. The shrinking Eopt can be attributed to the fact that boron atoms act as a fluxing agent to promote carbon atoms to form sp2 hybridization at low energy. Furthermore, boron atoms can impede the formation of σ bonds in carbon atom sp3 hybridization by forming B–C bonds with high energy, and induce the sp3 hybridization transfer to sp2 hybridization. This work is significant to further study of amorphous semiconductor films.

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“…13,14 Among the developed processes, the most useful approach involves depositing metallic interlayers or graded transition interlayers on substrates before the deposition of the TiN layer. It has been reported in several studies 9,15,16 that the Ti transition layer can dissolve the oxide on the substrate, release the shear stress, and hence improve the adhesion strength between the TiN layer and substrate. However, on the application of the TiN coatings prepared via this method, only the TiN layer containing the Ti transition layer slightly improved the antierosion performance of the alloy was lower than what was expected.…”

Section: Introductionmentioning

confidence: 99%

Improvement of anti‐erosion performance of TiN coatings through using a filtration cathode vacuum arc deposition method

Wang

Chen

et al. 2022

J Am Ceram Soc

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Sand erosion is a major factor that shortens the service life of aircraft in desert regions. The anti-erosion performance of titanium alloys may be improved using TiN coatings. However, few studies have employed Ti sputtering on Ti transition layers to improve the erosion resistance of the coatings. Herein, TiN coatings with a sputtering layer between the Ti transition layer and the TiN layer were deposited on a Ti-6Al-4V alloy by filtered cathodic vacuum arc deposition. For comparison, another group of TiN coatings without a Ti sputtering layer but processed using the same deposition parameters were prepared. The effects of the nanoscale sputtering layer on the microstructure, mechanical properties, and anti-erosion performance of the coatings were investigated using scanning electron microscopy, transmission electron microscopy, X-ray diffraction, and nanoindentation. The results show that the introduction of a Ti sputtering layer promoted the growth of TiN grains, leading to the formation of finer and denser TiN columnar grains. The preferred orientation of the coatings with the sputtering layer is (111) plane, whereas that of the coatings without the sputtering layer is (200) plane. The TiN coatings containing a sputtering layer exhibit higher hardness, elastic modulus, and H 3 /E 2 ratio, which enhances the anti-erosion performance of the coatings. The coatings with a sputtering layer exhibited better erosion resistance (erosion rate reduced by 75%) than the coatings without a sputtering layer. The underlying mechanism to understand the effect of the sputtering layer on the erosion resistance was discussed based on variations in the microstructure and mechanical properties of the coatings with and without the Ti sputtering layer. Ti sputtering layer was finally proved to be an effective method to improve the erosion resistance of TiN coatings.

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Effect of Ti Transition Layer Thickness on the Structure, Mechanical and Adhesion Properties of Ti-DLC Coatings on Aluminum Alloys

Cited by 52 publications

References 42 publications

Relationship between structure, surface topography and tribo-mechanical behavior of Ti-N thin films elaborated at different N2 flow rates

Relationship between structure, surface topography and tribo-mechanical behavior of Ti-N thin films elaborated at different N2 flow rates

Modulating Band Gap of Boron Doping in Amorphous Carbon Nano-Film

Improvement of anti‐erosion performance of TiN coatings through using a filtration cathode vacuum arc deposition method

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