Effect of Transition Metal Dopant on the Electrical Properties of ZnO-TiO2 Films Prepared by PLD Technique

Abstract

In this article, the influence of group nano transition metal oxides such as {(MnO2), (Fe2O3) and (CuO)} thin films on the (ZnO-TiO2) electric characteristics have been analyzed. The prepared films deposited on glass substrate laser Nd-YAG with wavelength (ℷ =1064 nm) ,energy of (800mJ) and number of shots (400). The density of the film was found to be (200 nm) at room temperature (RT) and annealing temperature (573K).Using DC Conductivity and Hall Effect, we obtained the electrical properties of the films. The DC Conductivity shows that that the activation energies decrease while the σRT at annealing temperature with different elements increases the formation of mixed oxides. The Hall effect, the electrical properties of the films were described. It was observed through Hall Effect measurements that the films loaded vectors of the shape N and the type P.

Effect of Annealing Process on the Morphological, Optical and Electrical Properties of Cu:MnO Films Prepared by PLD Technique

“…Using Hall Effect measurements, thin films of the pure and Cu-doped MnO with varying concentrations of Cu (0.03, 0.05, 0.07, and 0.09 wt%) were examined. By measuring the Hall voltage (V H ) produced by the Hall field throughout the sample thickness (t), the Hall coefficient (R H ) was calculated [42,43]:…”

Structural, Optical, and Electrical Characteristics of Titanium Dioxide Thin Films Prepared by Pulsed Laser Deposition

“…The films' conductivity rose when doped with metal oxides, and the maximum conductivity was achieved when treated according to the type of doped metal oxide. According to Hall Effect investigations, each film has both n and p charge carriers [8]. Joginder, et al (2022) showed that titanium dioxide (TiO2) thin films have a wide range of uses, and the various structures of the produced films can result in new or improved features.…”