2019
DOI: 10.1088/2053-1591/ab014a
|View full text |Cite
|
Sign up to set email alerts
|

Effect of varying low substrate temperature on sputtered aluminium films

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1
1

Citation Types

5
8
0

Year Published

2020
2020
2022
2022

Publication Types

Select...
3
2

Relationship

0
5

Authors

Journals

citations
Cited by 21 publications
(13 citation statements)
references
References 36 publications
5
8
0
Order By: Relevance
“…These layers are imaged by the atomic force microscope as long structures with ‘ridges’ between the adjacent structures. Similar results had been reported at higher magnification of the films .…”
Section: Resultssupporting
confidence: 91%
See 4 more Smart Citations
“…These layers are imaged by the atomic force microscope as long structures with ‘ridges’ between the adjacent structures. Similar results had been reported at higher magnification of the films .…”
Section: Resultssupporting
confidence: 91%
“…The field emission scanning electron microscope images reveal that at 44.5 °C, the microstructure consists of porous and amorphous structures, whereas at the highest temperature (100 °C), the microstructure is characterized by crystalline structures, Figure . Similar results were discussed for the same films in a previous article . The results were related to the increase in sputtering energy as the substrate temperature increased.…”
Section: Resultssupporting
confidence: 87%
See 3 more Smart Citations