In this study, thin films of CuInSe2 (CIS) are expeditiously fabricated within 1 s utilizing the pulsed laser welding (PLW) technique. Preceding the PLW process, thin films of InSe (500 nm) are coated with Cu nanosheets of 60 and 120 nm thicknesses using vacuum coating systems. The optimal PLW parameters leading to the formation of CIS films include a pulse width of 1.0 ms, a spot diameter of 2.0 mm, and a repetition frequency of 10 Hz. The resulting CIS films exhibited a well‐crystalline cubic structure with lattice parameters of 5.265 Å. Surface morphology analyses revealed the preferential formation of porous films with varying stoichiometry, a characteristic that can be manipulated by adjusting laser welding parameters. The energy band gap and room temperature electrical conductivity display values of 1.80 eV and 2.06 × 10−5 (Ωcm)−1, respectively. Cu‐rich samples exhibit a wider energy band gap of 1.94 eV and lower electrical conductivity values of 4.78 × 10−7 (Ωcm)−1. The CIS film demonstrates n‐type conductivity attributed to the formation of donor levels centered at 0.24 and 0.10 eV. This study presents an ultrafast method for fabricating CIS films with physical properties compatible with those produced using traditional methods.