Effective intensity distributions used for direct laser interference exposure

Abstract

This paper presents a method to obtain the periodic structures with different feature shapes in direct laser interference lithography. In the method, the desired structures are produced by controlling the effective intensity distributions of interference patterns during the exposure process. The effective intensity distributions are adjusted by changing the exposure beam intensity based on the material modification thresholds. In the simulations and experiments, the different exposure intensities were used to study the interactions between effective intensity distributions and materials, and the direct four-and six-beam laser interference lithography systems were set up to pattern silicon wafers. The shapes and sizes of the fabricated surface structures were changed with the effective intensities. The experimental results are in accordance with the theoretical models and simulations.

Holographic Fabrication of 3D Nanostructures

“…[47,[57][58][59][60][61][62][63][64] Figure 4a,b shows examples of optical alignment systems used to produce multiple beam interference. [58,59] The main advantage is high flexibility to generate 3D interference patterns by adjusting optical elements and configurations, which is useful for designing arbitrary geometries of interest.…”