Effective sputtering yields of titanium, titanium nitride, and molybdenum induced by nitrogen ions and ions of nitrogen-oxygen mixtures

Abstract

This work is dedicated to studying the effects of nitrogen ions and ions of nitrogen and oxygen mixtures on the surface of titanium, titanium nitride, and molybdenum. The usage of magnetron sputtering systems as a model device to study the effect of reactive gases on elements of electric jet engines is proposed and justified. The processes of sputtering of a surface exposed to non-monoenergetic ion beams are studied. The effective sputtering yields of titanium, titanium nitride, and molybdenum induced by argon and nitrogen ions and ions of nitrogen-oxygen mixtures at various intermediate-energy ion beams are determined. It is shown that the sputtering yields of reactive-gas ions are significantly lower than the sputtering yields of inert gases.

Plasmonic TiN, ZrN, and HfN Nanofluids for Solar-to-Heat Conversion

“…The unavailability of the data for ZrN and HfN urged us to perform the SRIM calculations; the results are also given in Table . A good match between the sputter yield of TiN reported in ref and calculated in this work validates the accuracy of the calculations. All three MeN species show lower sputter yields than their metal counterparts.…”

“… For the reactive sputtering, the mass flux and the deposition rate of NPs are lower than those of metals, evidencing that the target surface in the nitrided (poisoned) state should have a smaller sputter yield. In the literature, the data are available only for TiN, and they confirm the sputter yield of TiN almost twice as low as that of Ti. The unavailability of the data for ZrN and HfN urged us to perform the SRIM calculations; the results are also given in Table .…”

Mass‐to‐charge ion composition of plasma in a magnetron discharge with reactive sputtering of titanium target

“…Thus, for a magnetron discharge in an oxygen atmosphere, the adsorption of oxygen predominates over cathode sputtering. This leads to the formation of an oxide layer and poisoning of the surface of the cathode target, as shown in Dukhopel′nikov et al [24] The magnetron discharge current and the partial pressure of reactive gases affect the fraction of target material ions, for both nitrogen (Figure 7a) and oxygen (Figure 7b). Moreover, the trends of these dependencies are the same for both gases.…”

“…For the case of argon (Figure 2), singly and doubly ionized argon ions, and ions of all the stable titanium isotopes are evident in the spectrum. [28] In Figure 2, the relatively small amplitude of the titanium ion peaks, compared with the singly ionized argon peak, is associated with the low sputtering coefficient of titanium (≈0.33 for an argon ion energy of 400 eV [24] ), as well as with the 25-cm distance between the spectrometer and the magnetron target. We note, however, that this separation distance minimizes the undesirable deposition of the coating on the spectrometer electrodes, which affects the signal amplitude and resolution.…”

“…[23] In the reactive mode, an oxide or a nitride film is formed on the target surface, reducing the yield of target (titanium) atoms and changing the target emission properties. [23,24] Furthermore, the accumulation of a positive charge on the target surface can occur, which reduces the sputtering efficiency and results in other undesirable effects associated with the coating stoichiometry and its properties.…”