Thin iron films are interesting for fundamental studies
and have
applications in sensors, actuators, magnetic memory, and spintronic
devices. Here, the electrodeposition of thin iron films on Si(100)
is investigated with microscopy techniques and a modeling approach.
Atomic force microscopy images of films with thicknesses from 6 to
180 nm show initial island growth, and after the formation of a continuous
film, a decrease in the lateral correlation length is associated with
a decrease in the width of surface undulations. In thicknesses above
100 nm, a rapid increase in the roughness suggests the onset of unstable
growth. Transmission electron microscopy (TEM) images of 180 nm thick
films reveal the secondary nucleation of Fe grains, a feature that
was not previously observed in electrodeposited Fe films. These results
are interpreted in light of simulations of an electrodeposition model
that accounts for the interplay of diffusive cation flux in the electrolyte
and surface relaxation of adsorbed Fe atoms. In the thickest simulated
films, the unstable growth is controlled by the diffusive flux, and
the simulated samples have surface cliffs that resemble those of TEM
images. The model suggests that the sharp decrease in the correlation
length of the Fe films must be related to some transition in the surface
dynamics, consistent with the observed secondary nucleation. These
results may help the control of Fe film morphology in future studies.