Effects of angle of probe laser and pinhole diameter on the time-resolved optical inspection system

Kuo, Chil-Chyuan

doi:10.1016/j.ijleo.2010.09.045

Cited by 5 publications

(1 citation statement)

References 17 publications

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“…Excimer laser crystallization (ELC) is an industrial technique used for preparing poly-Si thin films on commercially available, inexpensive glass substrates for the development of high-performance TFTs in active-matrix flat panel displays. [1][2][3][4][5][6] A rapid deposition of the laser-energy density, on a nanosecond time scale, onto the surface region of the an amorphous-silicon (a-Si) thin film leads to its melting and recrystallisation into a poly-Si thin film, while keeping the glass substrate at a low temperature. The final quality of the device depends significantly on the phase-transformation mechanisms which need to be manipulated precisely for obtaining poly-Si thin films with a large grain size and a good uniformity.…”

Section: Introductionmentioning

confidence: 99%

A reliable approach to a rapid calculation of the grain size of polycrystalline thin films after excimer laser crystallization

Kuo¹

2015

Mater. Tehnol.

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Excimer laser crystallization (ELC) is the most commonly employed technology for fabricating low-temperature polycrystalline silicon (LTPS) thin films. The grain size of polycrystalline thin films after ELC is usually determined with a manual calculation, which includes certain disadvantages, i.e., human error and is time-consuming and exhausting. To mitigate these disadvantages, a high-efficiency approach to calculating the grain size of polycrystalline thin films automatically is proposed. It was found that the selected-boundary-definition approach is a promising candidate for calculating the grain size of polycrystalline thin films. The savings in the analysis time is up to 75 %. The average error rate of the measurement can be controlled within 8.33 %. Keywords: low-temperature polycrystalline silicon, automatic grain-size analysis, excimer laser crystallization UV-laserska kristalizacija (ELC) je najbolj pogosto uporabljena tehnologija za izdelavo nizkotemperaturne polikristalne tanke plasti silicija (LTPS). Velikost zrn v polikristalni tanki plasti po ELC se navadno dolo~a z ro~nim izra~unom, ki pa ima nekatere pomanjkljivosti, kot je~love{ka napaka, in je~asovno potratna in utrujajo~a. Za ubla`itev teh pomanjkljivosti je predlagan zelo u~inkovit, avtomati~en na~in za izra~un velikosti zrn v polikristalni tanki plasti. Ugotovljeno je, da je pribli`ek k selektivnemu dolo~anju meje obetajo~na~in za izra~un velikosti zrn polikristalnih tankih plasti. Prihranek~asa za analizo je do 75 %. Povpre~ni odmik napake pri meritvah je okrog 8,33 %. Klju~ne besede: nizkotemperaturni polikristalni silicij, avtomatska analiza velikosti zrn, UV-laserska kristalizacija

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Section: Introductionmentioning

confidence: 99%

A reliable approach to a rapid calculation of the grain size of polycrystalline thin films after excimer laser crystallization

Kuo¹

2015

Mater. Tehnol.

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A low‐cost and reliable optical inspection system for rapid surface roughness measurements of polycrystalline thin films

Kuo

Huang

2012

Materialwissenschaft Werkst

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Excimer laser crystallization is a well‐known industrially used technique to produce high‐performance polycrystalline silicon thin films on the commercially available inexpensive glass substrates for the development of high‐performance low temperature polycrystalline silicon thin‐film transistors in active matrix flat panel displays. A rapid optical measurement system for rapid surface roughness measurement of polycrystalline silicon thin films was developed in this study. Two kinds of thicknesses of polycrystalline silicon thin films were used to study rapid surface roughness measurements. Six different incident angles were employed for measuring surface roughness of polycrystalline silicon thin films. The results reveal that the incident angle of 20° was found to be a good candidate for measuring surface roughness of polycrystalline silicon thin films. Surface roughness (y) of polycrystalline silicon thin films can be determined rapidly from the average value of reflected direct current voltage (x) measured by the optical system developed using the trend equation of y = –8.9854x + 91.496. The maximum measurement error rate of the optical measurement system developed was less than 5.72%. The savings in measurement time was up to 83%.

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Rapid optical inspection of bubbles in the silicone rubber

Kuo

Chen

2013

Optik

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Effects of angle of probe laser and pinhole diameter on the time-resolved optical inspection system

Cited by 5 publications

References 17 publications

A reliable approach to a rapid calculation of the grain size of polycrystalline thin films after excimer laser crystallization

A reliable approach to a rapid calculation of the grain size of polycrystalline thin films after excimer laser crystallization

A low‐cost and reliable optical inspection system for rapid surface roughness measurements of polycrystalline thin films

Rapid optical inspection of bubbles in the silicone rubber

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