Effects of annealing temperature towards surface morphological and optical properties of black silicon fabricated by silver-assisted chemical etching

Noor, Nur Afidah Md.; Mohamad, Siti Khadijah; Hamil, Siti Sarah; Devarajan, Mutharasu; Pakhuruddin, Mohd Zamir

doi:10.1016/j.mssp.2018.11.006

Cited by 16 publications

(6 citation statements)

References 29 publications

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“…In 2019, N. Noor et al [46] used a post-coating heat treatment method to form noble metal nanoparticles. Silver assisted etching was used as the fabrication method.…”

Section: Metal Assisted Chemical Etchingmentioning

confidence: 99%

“…Due to the non-impurity-doped, the absorptivity decreases seriously at the wavelength of 1000 nm to 2200 nm. The researchers not only used MACE to fabricate black silicon, but also explored the optimization of the preparation process [46] through experiments. When a different etching time [54,55], solution metal ion density [53], or substrate thickness are used, the fabricated black silicon sample will have different optical properties.…”

Section: Metal Assisted Chemical Etchingmentioning

confidence: 99%

“…In 2015, S. Marthi et al [57] fabricated black silicon by MACE, and the researchers studied the effects of metal-assisted chemical etching at different times and substrate thickness on the optical properties of the material. The results express that the longer the time from 20 s to 180 s, The researchers not only used MACE to fabricate black silicon, but also explored the optimization of the preparation process [46] through experiments. When a different etching time [54,55], solution metal ion density [53], or substrate thickness are used, the fabricated black silicon sample will have different optical properties.…”

Section: Metal Assisted Chemical Etchingmentioning

confidence: 99%

“…(b,c) Using a post-coating heat treatment method to form noble metal nanoparticles. Adapted from reference[46], with permission from Elsevier © 2020. (d) Different etching time in high concentration Ag + solution.…”

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confidence: 99%

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Recent Progress of Black Silicon: From Fabrications to Applications

et al. 2020

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Since black silicon was discovered by coincidence, the special material was explored for many amazing material characteristics in optical, surface topography, and so on. Because of the material property, black silicon is applied in many spheres of a photodetector, photovoltaic cell, photo-electrocatalysis, antibacterial surfaces, and sensors. With the development of fabrication technology, black silicon has expanded in more and more applications and has become a research hotspot. Herein, this review systematically summarizes the fabricating method of black silicon, including nanosecond or femtosecond laser irradiation, metal-assisted chemical etching (MACE), reactive ion etching (RIE), wet chemical etching, electrochemical method, and plasma immersion ion implantation (PIII) methods. In addition, this review focuses on the progress in multiple black silicon applications in the past 10 years. Finally, the prospect of black silicon fabricating and various applications are outlined.

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“…In 2019, N. Noor et al [46] used a post-coating heat treatment method to form noble metal nanoparticles. Silver assisted etching was used as the fabrication method.…”

Section: Metal Assisted Chemical Etchingmentioning

confidence: 99%

Section: Metal Assisted Chemical Etchingmentioning

confidence: 99%

Section: Metal Assisted Chemical Etchingmentioning

confidence: 99%

mentioning

confidence: 99%

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Recent Progress of Black Silicon: From Fabrications to Applications

et al. 2020

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“…To assess light coupling performance of the b-Si, weighted average reflectance (WAR%) is calculated by integrating the reflectance of the b-Si with AM1.5G solar spectrum over 300-1100 nm wavelength region. This is expressed in Equation 1 [16], where R(λ) is the reflectance and S(λ) denotes the AM1.5G solar spectrum.…”

Section: Methodsmentioning

confidence: 99%

Broadband Anti-Reflection in Black Silicon Fabricated by Two-Step Silver-Assisted Wet Chemical Etching for Photovoltaics

Abdulkadir

Noor

Aziz

et al. 2020

SSP

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This paper reports broadband anti-reflection in black silicon (b-Si) fabricated by two-step metal-assisted chemical etching (MACE) for potential photovoltaic (PV) applications. The method involves deposition of silver nanoparticles (Ag NPs) in aqueous solution of HF:AgNO3, followed by etching in HF:H2O2:DI H2O solution for different duration (10-25 s). Effects of etching time towards surface morphological and optical properties of b-Si nanowires are investigated. Surface morphological characterization confirms presence of b-Si nanowires with heights of 350-570 nm and diameter of 150-300 nm. The b-Si nanowires exhibit outstanding broadband anti-reflection due to refractive index grading effect. This is represented as weighted average reflection (WAR) in the 300-1100 nm wavelength region. After 20 s of etching, b-Si nanowires with height of 570 nm and width of about 200 nm are produced. The nanowires demonstrate WAR of 5.5%, which represents the lowest WAR in this investigation. This results in absorption of 95.6% at wavelength of 600 nm. The enhanced broadband light absorption yields maximum potential short-circuit current density (Jsc(max)) of up to 39.7 mA/cm2, or 51% enhancement compared to c-Si reference. This facile b-Si fabrication method for broadband enhanced anti-reflection could be a promising technique to produce potential PV devices with high photocurrent.

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Silicon Surface Structuring

2022

Silicon

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Effects of annealing temperature towards surface morphological and optical properties of black silicon fabricated by silver-assisted chemical etching

Cited by 16 publications

References 29 publications

Recent Progress of Black Silicon: From Fabrications to Applications

Recent Progress of Black Silicon: From Fabrications to Applications

Broadband Anti-Reflection in Black Silicon Fabricated by Two-Step Silver-Assisted Wet Chemical Etching for Photovoltaics

Silicon Surface Structuring

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