2018
DOI: 10.1038/s41598-018-31194-y
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Effects of aspect ratio and metal layer thickness on demoulding of metal/polymer bilayer gratings during nanoimprinting

Abstract: During the fabrication of metal/polymer bilayer gratings by nanoimprint lithography, adhesion and friction forces at the interfaces can deform and damage the transferred pattern of the bilayer grating during the demoulding process. To improve the quality of bilayer gratings, the effects of the aspect ratio and metal layer thickness on deformation and stress during the demoulding process in the nanoimprinting of bilayer gratings were investigated. This information was used to determine the optimal grating param… Show more

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Cited by 11 publications
(9 citation statements)
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“…The SiO 2 mold (25 × 25 mm 2 ) had a periodic line array patterned with pitch of 200 nm, line width of 100 nm, and depth of 200 nm. Although it is more conducive to improving the mechanical stability of patterned devices with a small period and large aspect ratio, the imprinting and demolding process with a high aspect ratio and small period is a major issue in nanoimprinting technology [25,26,27]. The period of 200 nm and aspect ratio of 2:1 are relatively mature parameters in nanoimprint technology, being more conducive to the successful preparation of patterns.…”
Section: Methodsmentioning
confidence: 99%
“…The SiO 2 mold (25 × 25 mm 2 ) had a periodic line array patterned with pitch of 200 nm, line width of 100 nm, and depth of 200 nm. Although it is more conducive to improving the mechanical stability of patterned devices with a small period and large aspect ratio, the imprinting and demolding process with a high aspect ratio and small period is a major issue in nanoimprinting technology [25,26,27]. The period of 200 nm and aspect ratio of 2:1 are relatively mature parameters in nanoimprint technology, being more conducive to the successful preparation of patterns.…”
Section: Methodsmentioning
confidence: 99%
“…The three samples of Ag thin film deposited on bare, Ag nanowires (AgNWs)-treated and nanoimprinted PDMS substrates were used to investigate the performance of composite films. The PDMS (weight ratio of 10:1) was spin-coated on a periodic line array mold (pitch = 200 nm and line width = 100 nm) at a speed of 500 rpm, and reversal imprinted under a pressure of 25 bar at 80 °C for 3 h in vacuum-drying oven through NIL [35,36]. The nanoimprinted PDMS was obtained after demolding from the patterned mold.…”
Section: Methodsmentioning
confidence: 99%
“…рельефа по высоте профиля, превышающего значение периода. Глубина профиля может превышать ширину выступа в три раза, что технологически вполне реализуемо [18], хоть и может повлечь некоторые технологические сложности при изготовлении. Для прямоугольного профиля рельефа с фактором заполнения 0.3 отдельно приведены параметры для реализации квадратурной модуляции оптических сигналов, когда высота профиля значительно меньше периода.…”
Section: моделирование фазового распределения в оптической схеме интеunclassified