Effects of Chip Size and Thermally Oxidized AlxGa2–xO3 Sidewall on the Optoelectrical Characteristics of AlGaN-Based Deep Ultraviolet Micro-Light-Emitting Diodes
Tien-Yu Wang,
Wei-Chih Lai,
Qiao-Ju Xie
et al.
Abstract:The thermally oxidized Al x Ga 2−x O 3 sidewall was introduced to deep ultraviolet micro-light-emitting diodes (DUV μ-LEDs) to improve optoelectronic performance. Reducing the chip size of DUV μ-LEDs suppresses the current crowding effect and decreases the forward voltage (V f ) and dynamic resistance at a current density of 10 2 A/cm 2 . After the thermally oxidized Al x Ga 2−x O 3 sidewall was introduced, the V f and dynamic resistance in all DUV μ-LEDs with varying chip sizes increased. The V f and dynamic … Show more
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