Graphene grown directly
on Ge via chemical vapor deposition (CVD)
can passivate the underlying Ge surface, preventing its oxidation
in ambient air for at least months. However, the factors that govern
oxidation of Ge coated with graphene have not been elucidated. We
investigate the effect of graphene synthesis parameters and Ge surface
orientation on passivation of Ge and correlate these data with the
density and type of defects in graphene. Oxidation of Ge can be reduced
by increasing the H2:CH4 flux ratio or decreasing
the growth rate, which decrease the density of atomic-scale defects,
such as point defects and grain boundaries, in graphene. Oxidation
of graphene is concomitant with oxidation of Ge and occurs more readily
when the density of atomic-scale defects is relatively high. Passivation
of Ge, however, depends more strongly on Ge surface orientation, as
Ge(110) oxidizes significantly less than Ge(001) or Ge(111), even
at the same graphene defect density. These results provide a pathway
for engineering high-quality graphene films on Ge, which may enable
improved passivation of Ge and direct integration of graphene-based
or hybrid graphene/Ge heterostructure devices on conventional semiconductor
platforms.