2023
DOI: 10.1016/j.surfin.2023.102718
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Effects of different incidence rates of carbon and silicon clusters on the surface properties of SiC films

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Cited by 3 publications
(4 citation statements)
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“…Film density is paramount in materials science and engineering applications because it can affect the physical properties and behavior of a film; it can be expressed as follows , : where m denotes the film mass and L x , L y , and L z denote the film length, width, and thickness, respectively. The densities of the GaN thin films deposited on different substrate surfaces were investigated (Figure b).…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…Film density is paramount in materials science and engineering applications because it can affect the physical properties and behavior of a film; it can be expressed as follows , : where m denotes the film mass and L x , L y , and L z denote the film length, width, and thickness, respectively. The densities of the GaN thin films deposited on different substrate surfaces were investigated (Figure b).…”
Section: Resultsmentioning
confidence: 99%
“…According to Figure 4a, the variation in the substrate patterns results in distinct critical thicknesses. Film density is paramount in materials science and engineering applications because it can affect the physical properties and behavior of a film; it can be expressed as follows 30,34 :…”
Section: Resultsmentioning
confidence: 99%
“…In the field of crystal simulation growth, most of the researches have focused on the growth of thin films with heteroepitaxial GaAs [12][13][14][15][16][17][18], GaAs as substrates [19][20][21][22][23][24][25], and silicon carbide third-generation semiconductors [26][27][28][29]. However, heteroepitaxial growth encounters problems, such as lattice mismatch [30] and thermal adaptation, affecting the film growth, whereas homoepitaxial growth [31] can solve such problems.…”
Section: Introductionmentioning
confidence: 99%
“…With the advancement of computer technology, computational simulations have emerged as a primary method for studying crystal growth at the microscale. Molecular dynamics simulations enable the modeling of crystal growth environments under various conditions, allowing observation of defect evolution during growth and investigation of crystal quality and performance postgrowth. This study primarily utilizes molecular dynamics simulations to explore the growth mechanisms of SiC crystals, with a focus on the temperature-dependent growth rates of zinc blende and wurtzite structures and the evolution of defects influenced by twinning. Through detailed computations and visualizations, this paper delineates the dynamic nature of defect formation and discusses the characteristics of defect evolution across different crystal structures.…”
Section: Introductionmentioning
confidence: 99%