Effects of Electrode Positioning on the Atmospheric‐Pressure DBD Plasma Torch

Kuwabara, Atsushi; Kuroda, Shin–ichi; Kubota, Hitoshi

doi:10.1002/ppap.200400089

Cited by 8 publications

(5 citation statements)

References 10 publications

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“…The emission spectrum of He plasma contains spectral bands of He species with the most intense line at 706.5 nm (3 3 S → 2 3 P). [13,14] The spectrum also includes a group of N 2 emissions in the form of first negative system and second positive system, as well as the population of atomic oxygen at 777.4 nm and 844.6 nm.…”

Section: Optical Emission Spectroscopy (Oes)mentioning

confidence: 99%

A Nonequilibrium, Atmospheric‐Pressure Argon Plasma Torch for Deposition of Thin Silicon Dioxide Films

Kasih

Kuroda

Kubota

2007

Chemical Vapor Deposition

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A nonequilibrium, atmospheric-pressure plasma torch that can be generated either in He or Ar gas by using a pulsed highvoltage power supply with the discharge temperature in the range 22-35°C has been developed. This system is used to deposit silicon dioxide films from a hexamethyldisiloxane (HMDSO) precursor diluted in an oxygen carrier gas. It is concluded that, in terms of both quality and deposition rate at the same applied power, frequency, and gas composition, Ar plasma is more powerful than He plasma for depositing SiO 2 -like films. The maximum feed rate of HMDSO/O 2 injected into the Ar plasma torch is limited to 100 mL min -1 to ensure inorganic coatings are deposited. In order to improve the visual quality, without adversely affecting the inorganic features of the film, a small amount of nitrogen (N 2 ) can be added to the Ar as a working gas. When the ratio of Ar to N 2 in the flow gas is 30:1, the discharge behavior is transformed from filamentary to glowlike as a result of the quenching effect of admixed N 2 on Ar plasma.

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Section: Optical Emission Spectroscopy (Oes)mentioning

confidence: 99%

A Nonequilibrium, Atmospheric‐Pressure Argon Plasma Torch for Deposition of Thin Silicon Dioxide Films

Kasih

Kuroda

Kubota

2007

Chemical Vapor Deposition

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“…Low-temperature plasma processing is an effective method to modify the surface of a polymer material. We developed an atmospheric pressure dielectric barrier discharge (DBD) and surface discharge (SD) low temperature plasma [3,4] , and reported the characteristics of the plasma jet produced. However, the surface property (hydrophilicity) of the modified polymer is degraded with time.…”

Section: Introductionmentioning

confidence: 99%

Polymer Surface Treatment by Atmospheric Pressure Low Temperature Surface Discharge Plasma: Its Characteristics and Comparison with Low Pressure Oxygen Plasma Treatment

Kuwabara¹,

Kuroda²,

Kubota³

2007

Plasma Sci. Technol.

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The polymer treatment with a low-temperature plasma jet generated on the atmospheric pressure surface discharge (SD) plasma is performed. The change of the surface property over time in comparison with low pressure oxygen (O2) plasma treatment is examined. As one compares the treatment by atmospheric pressure plasma to that by the low pressure O2 plasma of PS (polystyrene) the treatment effects were almost in complete agreement. However, when the atmospheric pressure plasma was used for PP(polypropylene), it produced remarkable hydrophilic effects.

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“…We have developed atmospheric pressure DBD low-temperature plasma torch, and reported the characteristics of plasma jet that is produced by this plasma torch [3]. We tried to make larger the diameter of torch and make the dielectric flatter in order to extend the application of this plasma torch, but it was difficult to produce the stable and uniform plasma jet.…”

Section: Introductionmentioning

confidence: 98%

Development of Atmospheric Pressure Low Temperature Surface Discharge Plasma Torch and Application to Polypropylene Surface Treatment

Kuwabara

Kuroda

Kubota

2008

Plasma Chem Plasma Process

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We have finally succeeded in producing the plasma jet by use of the surface discharge plasma torch that can be expected to make larger the diameter of torch in the comparatively easy way. It can be checked that the active species in the jet obtained are different depending on the direction of connection, and also it was clearly found that much O and N 2 is included in them. Consequently, etching was confirmed at the position of 10 mm from the torch end in the surface treatment of polypropylene film, but etching was not confirmed at the position of 20 mm.

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Effects of Electrode Positioning on the Atmospheric‐Pressure DBD Plasma Torch

Cited by 8 publications

References 10 publications

A Nonequilibrium, Atmospheric‐Pressure Argon Plasma Torch for Deposition of Thin Silicon Dioxide Films

A Nonequilibrium, Atmospheric‐Pressure Argon Plasma Torch for Deposition of Thin Silicon Dioxide Films

Polymer Surface Treatment by Atmospheric Pressure Low Temperature Surface Discharge Plasma: Its Characteristics and Comparison with Low Pressure Oxygen Plasma Treatment

Development of Atmospheric Pressure Low Temperature Surface Discharge Plasma Torch and Application to Polypropylene Surface Treatment

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