Effects of Electrode Potential on the Adsorption Behavior of TBPS on an Au Surface

Krug, Klaus; Liu, Yung Fang; Uchida, Tatsuo; Osawa, Masatoshi; Yau, Shueh Lin; Lee, Yuh Lang

doi:10.1016/j.electacta.2017.03.072

Cited by 5 publications

(7 citation statements)

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“…2a , the corresponding peaks demonstrate a good agreement in the peak positions, although a slight shift exists and, furthermore, the as-SO peak becomes boarder with a lower intensity. This result is similar to the SEIRAS spectra of TBPS adsorbed on Au-coated Si prism 24 . Since the as-SO stretching mode is associated with a lie-down orientation of adsorbed molecular on the surface, the lower intensity of as-SO peak for the TBPS adlayer, compared to that of free TBPS in the air, suggests that the adsorbed molecules incline slightly to the surface normal.…”

Section: Seiras Analysissupporting

confidence: 85%

“…The CV and SEIRAS experiments were performed using an Au 111 single crystal electrode and an Au-coated Si prism, respectively. In a previous work 24 , it had been shown that the characteristic of the CV curves obtained for the two electrodes have good qualitative agreement, indicating that the terraces on the polycrystalline Au film on Si prism has mainly a 111 orientation. Therefore, an Au 111 single crystal electrode was used to study the CV behavior of Cu deposition on the Au-coated film.…”

Section: Cyclic Voltammetry Analysismentioning

confidence: 72%

“…Comparing the adsorption characteristics of TBPS on Au-coated 24 and Cu-coated surfaces, the two spectra are quite similar. However, the ss-SO peak shifts slightly from 1047 for Au to 1045 cm 1 for Cu which can be ascribed to the effect of different molecule-substrate interactions.…”

Section: Seiras Analysismentioning

confidence: 90%

“…To reduce the oxygen content, the cell and the solutions were purged with nitrogen gas N 5.5 . The details principle and process and of the SEIRAS experiments were described in a previous work 24 . A Fourier Transform IR Spectrometer Bio-Rad FTS 60A/896 with MCT detector in attenuated total reflection mode ATR-SEIRAS was utilized for this analysis.…”

Section: Methodsmentioning

confidence: 99%

“…Therefore, adsorption behavior of the several accelerators had been studied in the literature by cyclic voltammetry CV or scanning tunneling microscopy techniques 12 15 . In a previous study, surface Enhanced Infrared Adsorption Spectroscopy SEIRAS was utilized to study the adsorption behavior of TBPS on an Au film 24 . SEIRAS in attenuated total reflection mode ATR-SEIRAS facilitates the investigation of the structural composition at the interface with a specific sensitivity to adsorbed molecules much higher than that obtained by an Infrared Reflection Absorption Spectroscopy IRRAS .…”

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confidence: 99%

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Adsorption Behavior of TBPS in the Process of Cu Electrodeposition on an Au Film

et al. 2017

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The adsorption behavior of an Cu electroplating additive, 3,3 thiobis-(1-propanesulfonic acid sodium salt) (TBPS) in a process of Cu deposition onto a single crystalline Au(111) surface is studied by an in-situ Surface-Enhanced Infrared Absorption Spectroscopy (SEIRAS). The SEIRAS spectra of the TBPS adlayer on a Cu film is investigated first and compared to that on an Au film. These results are utilized to evaluate the characteristics of TBPS adlayer on the electrode surface during the Cu deposition and stripping processes. The results show that the SEIRAS spectra of TBPS adsorbed on the Cu film resembles closely to that on the Au film, and the most pronounced peaks are symmetric S-O (ss-SO) and asymmetric S-O (as-SO) stretching modes. However, the as-SO band is sharper with a higher intensity on the Cu film. Since the ss-SO and as-SO peaks correspond to the molecular with upright and lie-down orientations, respectively, it implies that the TBPS molecules have higher ratio of lie-down orientation on the Cu film. In the Cu electrodeposition process, the cyclic voltammetry (CV) result shows that the presence of the TBPS in the HClO solution can decrease the inhibition effect of HClO to the Cu deposition. For the spectra measured at various potential during cathodic and anodic sweeping, an obvious change of the spectra occurs at ca. 0.6 V, the initiation of Cu underpotential deposition (Cu-UPD). For potentials higher and lower than 0.6 V, the spectra are similar, respectively, to those measured for the Au and Cu films. This result indicates that the TBPS molecules originally adsorbing on the Au film transfer to the surface of deposited Cu layer. This inference is also confirmed by the variation in wavenumber and peak intensity of ss-SO and as-SO peaks during the potential sweeping.

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Section: Seiras Analysissupporting

confidence: 85%

Section: Cyclic Voltammetry Analysismentioning

confidence: 72%

Section: Seiras Analysismentioning

confidence: 90%

Section: Methodsmentioning

confidence: 99%

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confidence: 99%

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