Effects of experimental parameters on NF3 decomposition fraction in an oxygen-based RF plasma environment

Photoreduction of nitrogen trifluoride with controlled release of radicals

“…Another NF 3 degradation process may be ascribed to the photoreduction reactions of NF 3 with reductive free radicals (such as active allyls) and excited C=C bonds derived from the photodecomposition of PI natural rubber. The reductive excited C=C bonds and allyl radicals were described by Song et al . It has been reported that all the radicals such as methyl, trifluoromethyl, ethyl, isopropyl and t‐butyl were found to abstract the difluoroamino group from nitrogen trifluoride.…”

Gas-phase ion chemistry of NF3/SO2 mixtures: A mass spectrometric and theoretical investigation

“…In fact, during the etching and cleaning processes, the dissociation of pure or diluted (for example, with helium, argon, or oxygen) NF 3 generates the chemically active fluorine atoms as well as ionic species such as NF x + (x = 1-3), N 2 F + , and NO x + (x = 1, 2) [25] whose active role is substantiated by experimental [26][27][28] and theoretical evidence [29,30]. A detailed knowledge of the ion chemistry of NF 3 /O 2 and NF 3 /N 2 gaseous mixtures is also of interest for the proposed use of O 2 -and N 2 -based plasmas [31,32] to reduce the atmospheric emissions of NF 3 . For example, a recent kinetic modeling of the NF 3 decomposition via dielectric barrier discharge in NF 3 /N 2 [33] lists nearly twenty ionic processes involving NF 3 and NF x + (x = 1-3).…”

Environmental and health risk analysis of nitrogen trifluoride (NF3), a toxic and potent greenhouse gas

“…Recently, many researches have addressed the decomposition technologies of NF 3 and the formation mechanism of its decomposed products [18,21,23], the published information on the hazard to occupational health and on environmental risks of exposing to these toxic substances and the fluorides probably produced from the exhaust control in the destruction-wet scrubbing system was scarcely addressed or reviewed in the literature. The manuscript is based on the previous works [24,25] that addressed the analysis of the environmental and health risk of sulfur hexafluoride (SF 6 ) and its decomposition products in detail.…”

“…On the other hand, NF 3 has been recognized as a stable gas at room temperature [14], but its toxic decomposition products while applying and/or abating by electrical discharge (e.g., plasma) or other destruction methods have aroused the concern about their potential hazard, especially in fluorides and nitrogen oxides emissions [15]. The toxic products containing fluorine and/or nitrogen in the NF 3 decomposition probably include NF 3 O, F 2 , HF, SiF 4 , NO 2 , NO, N 2 O, HNO 2 , and HNO 3 [15][16][17][18][19][20][21][22][23]. Although these highly reactive and toxic species are well known as water-soluble products, small quantities of these products, not completely solved in the wet scrubbing, are probably found in the vent gas.…”