Effects of experimental parameters on the physical properties of non-stoichiometric sputtered vanadium nitrides films

Gueddaoui, H.; Schmerber, G.; Abes, M.; Guemmaz, M.; Parlebas, J.C.

doi:10.1016/j.cattod.2005.11.079

Cited by 15 publications

(8 citation statements)

References 9 publications

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“…Two diffraction peaks VN (111) and (200) at 43?96 and 51?83u respectively referred to JCPDS (00-073-0528) and a minor V 2 N (110) at 43?03u JCPDS (00-032-1413) are detected; similar peaks were also detected in previous studies. 24 No apparent peak shift is observed for this film. Moreover, minor V 5 O 9 (101) and (0-22) diffraction peaks are located at 30?58 and 35?50u JCPDS (00-018-1450) respectively.…”

Section: Microstructure and Chemical Compositionmentioning

confidence: 77%

Influence of vanadium on structure, mechanical and tribological properties of CrN coatings

Aissani¹,

Nouveau²,

Walock³

et al. 2015

Surface Engineering

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This work aims to show the characterisation of Cr-V-N coatings, with the varied amounts of Cr and V. CrN, VN and Cr-V-N coatings were deposited onto silicon and XC100 steel substrates by reactive radio frequency magnetron sputtering and characterised with X-ray diffraction, X-ray photoelectron spectroscopies, energy dispersive X-ray spectroscopy, scanning electron microscopy, nanoindentation, pin on disc tribological tests and scratch tests. The residual stress was calculated using the Stoney formula. Compared to the CrN system, the Cr-V-N films presented a rough surface based on pyramidal morphology. A hardness of 19?53 GPa and a friction coefficient of 0?55 were obtained for CrN; in contrast, Cr-V-N coatings presented a weak hardness of 6?23 GPa. In the case of wear against a 100Cr6 ball, the Cr-V-N films were completely removed from the substrate, even though the Cr-V-N coating presented a low friction coefficient (0?39). However, the VN film showed good tribological performance.

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Section: Microstructure and Chemical Compositionmentioning

confidence: 77%

Influence of vanadium on structure, mechanical and tribological properties of CrN coatings

Aissani¹,

Nouveau²,

Walock³

et al. 2015

Surface Engineering

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“…Takeyama et al [4,11] have demonstrated that nanocrystalline textured vanadium nitride films grown between Cu and SiO 2 are chemically inert, and do not react with the adjoining layers, and are structurally stable. In the past, vanadium nitride films have been grown by atomic layer deposition [10,13], direct nitridation of vanadium films at elevated temperature [7], reactive electron beam evaporation [6], reactive dc sputtering [4,14,15], pulsed laser deposition [16,17], reactive magnetron sputtering [5,[18][19][20][21][22] and reactive ion beam sputtering [12]. It is known that the chemical composition, microstructure and hence, the material properties (such as optical, electrical and magnetic properties) of vanadium nitride films depend heavily on deposition parameters.…”

Section: Vanadium and Vanadium Nitride Thin Films Grown By High Power...mentioning

confidence: 99%

Vanadium and vanadium nitride thin films grown by high power impulse magnetron sputtering

Hajihoseini

Guðmundsson

2017

J. Phys. D: Appl. Phys.

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Thin vanadium and vanadium nitride films were grown on SiO2 by non-reactive and reactive high power impulse magnetron sputtering (HiPIMS), respectively. The film properties were compared to films grown by conventional dc magnetron sputtering (dcMS) at similar conditions. We explored the influence of the stationary magnetic confinement field strength on the film properties and the process parameters. The deposition rate is much lower for non-reactive sputtering by HiPIMS than for dcMS. Furthermore, for both dcMS and HiPIMS the deposition rate is lower for strong magnetic confinement. Structural characterization was carried out using x-ray diffraction and reflection methods as well as atomic force microscopy and scanning electron microscope. Both dcMS and HiPIMS grown vanadium films are polycrystalline with similar grain size regardless of magnetic field strength. For dcMS grown vanadium films the surface roughness is higher when a strong magnetic field is used. For both non-reactive growth of vanadium and reactive growth of vanadium nitride the HiPIMS process produces denser films with lower surface roughness than dcMS does. Lowering the magnetic field strength increases the deposition rate significantly for reactive HiPIMS while it increases only slightly in the reactive dcMS case. The films grown by HiPIMS with strong magnetic confinement exhibit higher density and lower roughness. We find that the operating pressure, growth temperature, discharge voltage and film thickness has influence on the properties of HiPIMS grown vanadium nitride films. The films are denser when grown at high temperature, high discharge voltage and low pressure. The density of those films is lower for thicker films and thicker films consist of larger grain size. For all the films explored, higher density coincides with lower surface roughness. Thus, the deposition method, magnetic field strength, growth temperature, discharge voltage, film thickness and growth pressure have a significant influence on the film quality and structural properties, including the grain size for the various orientations.

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“…We note that most of the peaks of phases CHARACTERIZATION OF Mo-V-N COATINGS DEPOSITED ON XC100 SUBSTRATE 671 sity of V 2 N (110) at 43.03C. These peaks were also detected for the coatings (V-Ti-N) [20]. A vanadium oxide V 5 O 9 (101) and (0-22) of low intensity peaks were also detected respectively at 30.58C and 35.50C.…”

Section: Resultsmentioning

confidence: 69%

Characterisation of Mo–V–N Coatings Deposited on XC100 Substrate by Sputtering Cathodic Magnetron

Chermime¹,

Abboudi²,

Djebaili³

et al. 2017

Metallofiz. Noveishie Tekhnol.

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The aim of this work is the characterization of ternary molybdenum-vanadium nitride (Mo-V-N) coatings deposited on silicon and XC100 steel substrates by the reactive radiofrequency dual magnetron sputtering with different contents of the Mo and V targets and nitrogen as reactive gas. The metal-target bias voltages are varied from 300 to 900 V. The hardness, surface morphology, microstructure and composition are studied by nanoindentation, scanning electron microscopy, atomic-force microscopy, and x-ray diffractometry. The Mo-V-N films manifest pyramidal surface morphology, high roughness (of 13.5 nm), but low mechanical properties. Hardness and Young's modulus are found in the ranges of 10-18 GPa and 100-335 GPa, respectively. The residual stresses of coatings are compressive and varied between 0.8 GPa and 2.5 GPa (calculated with the Stoney formula).Keywords: coatings, microstructure, residual stresses, roughness, hardness.Метою даної роботи є характеризація покриттів із трикомпонентного мо-лібден-ванадійового нітриду (Mo-V-N), що наносилися на кремнійові та сталеві (XC100) поверхні шляхом реактивного радіочастотного магнет-ронного двокатодного розпорошення цілей із різним вмістом Мо та V із використанням азоту в якості реакційноздатного газу. Відхили напруги зміщення металевої цілі варіювалися від 300 до 900 В. Твердість, морфо-логію поверхні, мікроструктуру та склад було досліджено за допомогою

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Effects of experimental parameters on the physical properties of non-stoichiometric sputtered vanadium nitrides films

Cited by 15 publications

References 9 publications

Influence of vanadium on structure, mechanical and tribological properties of CrN coatings

Influence of vanadium on structure, mechanical and tribological properties of CrN coatings

Vanadium and vanadium nitride thin films grown by high power impulse magnetron sputtering

Characterisation of Mo–V–N Coatings Deposited on XC100 Substrate by Sputtering Cathodic Magnetron

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