2019
DOI: 10.1063/1.5095953
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Effects of forming gas annealing on luminescence properties of erbium silicate thin films

Abstract: While hydrogen passivation has led to enhanced luminescence in many erbium doped materials, its effects on Er oxides/silicates compounds has rarely been demonstrated. Here we report effects of forming gas annealing on the luminescence properties in such Er compound materials. A broad band photoluminescence in the ultraviolet/visible range, likely arising from structural defects in the material, is significantly suppressed after forming gas annealing. Concurrently, the Er near-infrared luminescence intensity an… Show more

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Cited by 3 publications
(3 citation statements)
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“…Though a precise estimation of the length covered by Er:Y 2 O 3 cannot be given with high accuracy, we can assert that at a depth of about 1.5 µm from the top, the presence of Y 2 O 3 is reduced below 10% of its concentration on the NWs tips for all the tilt angles. Moreover, we can exclude the formation of Er silicate at the interface between Er:Y 2 O 3 and Si NWs due to the low substrate temperature of 300° C used during the deposition, as already demonstrated in literature 33 , 41 .…”
Section: Resultsmentioning
confidence: 70%
“…Though a precise estimation of the length covered by Er:Y 2 O 3 cannot be given with high accuracy, we can assert that at a depth of about 1.5 µm from the top, the presence of Y 2 O 3 is reduced below 10% of its concentration on the NWs tips for all the tilt angles. Moreover, we can exclude the formation of Er silicate at the interface between Er:Y 2 O 3 and Si NWs due to the low substrate temperature of 300° C used during the deposition, as already demonstrated in literature 33 , 41 .…”
Section: Resultsmentioning
confidence: 70%
“…The average band gap energy of H250, H350, and H450 is approximately 2.0, 1.95, and 1.86 eV, respectively. The marked improved light-harvesting ability of the composite nanorods formed after high-temperature hydrogen gas-contained annealing may be attributed to the increased surface defects after the annealing process [38], and the surface thin Bi 2 O 3 layer reduction engendered formation of metallic Bi particles. Similarity, Lu et al, shows the surface oxygen vacancies possess a new donor level, which endow the Bi 2 O 3 /Bi 2 O 2 CO 3 semiconductor with the narrowed band gap energy to facilitate improved visible light harvesting [39].…”
Section: Resultsmentioning
confidence: 99%
“…The first stage of CL intensity increases (up to 850 • C), dealing with homogeneous distribution of all elements, especially Er ions, in the Er:Al 2 O 3 layer. It can be associated with recovering of growth defects and densification of the film such as the O vacancy defects originally present in the sample that may have been removed by the annealing treatment [33]. Also, the increase of the Er-related luminescence can partially be explained by the formation of Er-O complexes that appear after annealing.…”
Section: Atom Probe Tomographymentioning
confidence: 99%