2016
DOI: 10.1016/j.spmi.2016.08.025
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Effects of growth temperature on characteristics of Mg-delta-doped p-AlInGaN epi-layers

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Cited by 4 publications
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“…On the other hand, the tilted energy band in the active region will increase the electron leakage into the p-type hole injection layer, which may recombine with holes in the p-region and further suppresses the hole injection capability [5]. Proposals to suppress the QCSE in the active region include using the non-polar and semipolar substrate [6,7] and utilizing the AlInGaN/AlInGaN MQW region [8,9]. However, the above methods have strict requirements for epitaxial growth technology.…”
Section: Introductionmentioning
confidence: 99%
“…On the other hand, the tilted energy band in the active region will increase the electron leakage into the p-type hole injection layer, which may recombine with holes in the p-region and further suppresses the hole injection capability [5]. Proposals to suppress the QCSE in the active region include using the non-polar and semipolar substrate [6,7] and utilizing the AlInGaN/AlInGaN MQW region [8,9]. However, the above methods have strict requirements for epitaxial growth technology.…”
Section: Introductionmentioning
confidence: 99%