Effects of heat treatment on properties of ITO films prepared by rf magnetron sputtering

Hu, Yu‐Chen; Diao, Xungang; Wang, Wenwen; Hao, Weichang; Wang, Tianmin

doi:10.1016/j.vacuum.2004.01.081

Cited by 230 publications

(117 citation statements)

References 18 publications

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“…The main technique for depositing ITO is magnetron sputtering, and the properties of the obtained thick films are thoroughly investigated [106][107][108][109][110][111][112][113][114][115]. Using this technique, films with thicknesses as low as 10 nm may be deposited [98,116], although their uniformity was not investigated.…”

Section: Indium Tin Oxide Filmsmentioning

confidence: 99%

Ultra-thin films for plasmonics: a technology overview

Malureanu

Lavrinenko

2015

Nanotechnology Reviews

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Ultra-thin films with low surface roughness that support surface plasmon-polaritons in the infra-red and visible ranges are needed in order to improve the performance of devices based on the manipulation of plasmon propagation. Increasing amount of efforts is made in order not only to improve the quality of the deposited layers but also to diminish their thickness and to find new materials that could be used in this field. In this review, we consider various thin films used in the field of plasmonics and metamaterials in the visible and IR range. We focus our presentation on technological issues of their deposition and reported characterization of film plasmonic performance.

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Section: Indium Tin Oxide Filmsmentioning

confidence: 99%

Ultra-thin films for plasmonics: a technology overview

Malureanu

Lavrinenko

2015

Nanotechnology Reviews

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“…Generally, a transparent electromagnetic wave shielding material is required to have the shielding capacity above 20db, and the optical transmissivity above 60% within the visible spectrum (380~780 nm). [7][8][9] ITO exhibits an optical transmissivity above 80% and excellent electrical conductivity. Consequently, research activities related to the manufacture of ITO film and its property enhancement are being conducted actively.…”

Section: Introductionmentioning

confidence: 99%

“…Consequently, research activities related to the manufacture of ITO film and its property enhancement are being conducted actively. [7][8][9] However, there hasn't been too much research effort regarding the mass production of indium oxide powder 10) and tin oxide powder with average particle size below 50 nm and uniform particle size distribution. In particular, there has been hardly any research activity related to the manufacture of nano-size tin oxide powder due to the engineering difficulties.…”

Section: Introductionmentioning

confidence: 99%

Preparation of Nano-Sized Tin Oxide Powder from Tin Chloride Solution by Spray Pyrolysis Process

Yu¹,

Kim²

2011

Korean. J. Mater. Res.

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In this study, by using tin chloride solution as a raw material, a nano-sized tin oxide powder with an average particle size below 50 nm is generated by a spray pyrolysis process. The properties of the generated tin oxide powder depending on the inflow speed of the raw material solution are examined. When the inflow speed of the raw material solution is 2 ml/min, the majority of generated particles appear in the shape of independent polygons with average size above 80-100 nm, while droplet-shaped particles show an average size of approximately 30 nm. When the inflow speed is increased to 5 ml/min, the ratio of independent particles decreases, and the average particle size is approximately 80-100 nm. When the inflow speed is increased to 20 ml/min, the ratio of droplet-shaped particles increases, whereas the ratio of independent particles with average size of 80-100 nm decreases. When the inflow speed is increased to 100 ml/min, the average size of the generated particles is around 30-40 nm, and most of them maintain a droplet shape. With a rise of inflow speed from 2 ml/min to 5 ml/min, a slight increase of the XRD peak intensity and a minor decrease of specific surface area are observed. When the inflow speed is increased to 20 ml/min, the XRD peak intensity falls dramatically, although a significant rise of specific surface area is observed. When the inflow speed is increased to 100 ml/min, the XRD peak intensity further decreases, while the specific surface area increases.Key words tin chloride solution, spray pyrolysis process, nano-sized tin oxide powder, average particle size, inflow speed of raw material solution.

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“…Consequently, research activities related to the manufacture of ITO film and its property enhancement are being conducted actively. [1][2][3][4][5] However, there hasn't been too much research effort regarding the effective recycling of waste ITO target generated from the manufacturing process of ITO film. Ideally, ITO target is required to have excellent sinterability, but practically ITO target is an unsinterable material.…”

Section: Introductionmentioning

confidence: 99%

Fabrication of Nano-Sized ITO Powder from Waste ITO Target by Spray Pyrolysis Process

Kang

Jung

et al. 2007

Mater. Trans.

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In this study, a nano-sized ITO powder with the average particle size below 50 nm by using waste ITO target is generated by spray pyrolysis proces. This study also examines the influences of reaction parameters such as reaction temperature, concentration and inflow speed of raw material solution on the properties of the generated ITO powder.As the reaction temperature increases from 800 C to 1100 C, the average particle size of the generated ITO powder increases from 40 nm to 100 nm, the microstructure gradually becomes compact, the particle size distribution becomes increasingly irregular, the XRD peak intensity gradually increases, and the specific surface area decreases.When the concentration of the solution is at 50 g/L, the average particle size of the ITO powder is below 30 nm, and the particle size distribution appears comparatively uniform. As the concentration reaches 400 g/L, which is close to the saturated concentration, the particle size distribution appears extremely irregular, and the particles with the size ranging from 20 nm to 100 nm coexist. Along with the rise of concentration, the XRD peak intensity gradually increases, yet the specific surface area decreases.As the inflow speed of the raw material solution increases from 2 mL/min to 100 mL/min, the average particle size of the ITO powder increases from 30 nm to 90 nm, yet the particle size distribution becomes irregular, and individual particles appear in the distinct shape of polygon. Along with the rise of inflow speed, the XRD peak intensity gradually increases, and the specific surface area decreases.

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Effects of heat treatment on properties of ITO films prepared by rf magnetron sputtering

Cited by 230 publications

References 18 publications

Ultra-thin films for plasmonics: a technology overview

Ultra-thin films for plasmonics: a technology overview

Preparation of Nano-Sized Tin Oxide Powder from Tin Chloride Solution by Spray Pyrolysis Process

Fabrication of Nano-Sized ITO Powder from Waste ITO Target by Spray Pyrolysis Process

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