Effects of illumination non-uniformity on the double-Ronchi lateral shearing interference field

Double-Ronchi shearing interferometry is a promising wavefront aberration measurement system for advanced lithography projection lens systems. The image grating defocusing is a key systematic error of the interferometer. However, the effects and elimination of this error have not been systematically researched. In this work, the interference field effects caused by the image grating defocusing are analyzed based on the theories of scalar diffraction, and a method to eliminate the effects is proposed. The theoretical analysis has been verified by a simulation and experiments. The results show that the error of image grating defocusing is mainly expressed as the Zernike Z4 term and Z9 term in the reconstructed wavefront, and the coefficients of Z4, and Z9, respectively, are related to NA2, NA4, and the defocus distance z. When the numerical aperture (NA) of the under-test projection lens is 0.6, 99.8384% of the errors caused by the image grating defocusing can be removed. When the NA is reduced to 0.3, 99.9854% of the errors can be removed. Additionally, when the NA is less than 0.1, almost all the errors can be eliminated.

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Lateral shearing interferometry method based on double-checkerboard grating by suppressing aliasing effect

Liu,

Shi,

Zhu

et al. 2024

Opt. Express

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Ronchi lateral shearing interferometry is a promising wavefront sensing technology with the advantages of simple structure and no reference light, which can realize a high-precision wavefront aberration measurement. To obtain shear information in both directions, the conventional double-Ronchi interferometer sequentially applies two orthogonal one-dimensional Ronchi gratings as the object-plane splitting element of the optics under test. Simultaneously, another Ronchi grating is positioned on the image plane in the same orientation to capture two sets of interferograms, thereby enabling two-dimensional wavefront reconstruction. Mechanical errors will inevitably be introduced during grating conversion, affecting reconstruction accuracy. Based on this, we propose a lateral shearing interferometry applying double-checkerboard grating. Only unidirectional phase shift is needed to obtain shear information in two directions while evading the grating conversion step, aiming to streamline operational processes and mitigate the potential for avoidable errors. We employ scalar diffraction theory to analyze the full optical path propagation process of the double-checkerboard shearing interferometry and introduce a new reconstruction algorithm to effectively extract the two-dimensional shear phase by changing the grating morphology, suppressing the aliasing effect of irrelevant diffraction orders. We reduce the fitting error through iterative optimization to realize high-precision wavefront reconstruction. Compared with conventional Ronchi lateral shearing interferometry, the proposed method exhibits better robustness and stability in noisy environments.

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Effects of illumination non-uniformity on the double-Ronchi lateral shearing interference field

Cited by 3 publications

References 18 publications

Improved Ronchi lateral-shearing interferometry based on sinusoidal amplitude grating

Improved Ronchi lateral-shearing interferometry based on sinusoidal amplitude grating

Effects and elimination of image grating defocusing on a double-Ronchi shearing interference field

Lateral shearing interferometry method based on double-checkerboard grating by suppressing aliasing effect

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