2013 IEEE 39th Photovoltaic Specialists Conference (PVSC) 2013
DOI: 10.1109/pvsc.2013.6744887
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Effects of in situ annealing on GaInNAs solar cells

Abstract: GaInNAs solar cells grown by metal-organic, chemical vapor deposition (MOCVD) are known to demonstrate dramatic changes in performance upon annealing. GaInNAs necessarily experiences some in situ annealing when integrated into a multijunction cell, as when the upper four junctions of a six-junction (e.g., AlGaInP/GaInP/AlGaInAs/GaInAs/ GaInNAs/Ge) cell are grown on top of the GaInNAs subcell. Therefore, understanding the changes that occur during these inadvertent, in situ anneals is necessary to design an MOC… Show more

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Cited by 7 publications
(8 citation statements)
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“…This directly indicates a movement of the pn-junction location and that the conductivity type of the GaInNAs layer must have changed its character upon annealing. Conductivity type changes in GaInNAs have also been seen by other authors in thermally annealed MOCVD-grown GaInNAs [17,18] and in MBE-grown GaInNAs [19].…”
Section: P-i-n Solar Cellssupporting
confidence: 79%
“…This directly indicates a movement of the pn-junction location and that the conductivity type of the GaInNAs layer must have changed its character upon annealing. Conductivity type changes in GaInNAs have also been seen by other authors in thermally annealed MOCVD-grown GaInNAs [17,18] and in MBE-grown GaInNAs [19].…”
Section: P-i-n Solar Cellssupporting
confidence: 79%
“…It can be seen that the EQEs of GaInNAs solar cell are obviously enhanced by DBR in the corresponding wavelength range. Moreover, compared with few reported results of dilute nitride solar cells grown by MOVPE, 6,22) the spectral response here shows an encouraging improvement. The photocurrents calculated from measured spectral responses (J sr ) of the devices with and without DBR are 13.66 mA cm −2 and 11.17 mA cm −2 (AM0 spectrum), respectively.…”
supporting
confidence: 66%
“…In the D1 design, a nominally intrinsic InGaAsN(Sb) absorber layer of 1.0-μm thickness was used, similar to many previous works on InGaAsN(Sb) cells. 9,13 D2 is identical except for the use of a thinner absorber of 0.65-μm thickness, as listed in Table 1. Both D1 and D2 include a 0.2-μm sacrificial dilute nitride layer to incorporate any pre-existing surface impurities, as suggested by Ptak.…”
Section: Methodsmentioning
confidence: 99%
“…8 Due to the short diffusion length in InGaAsN(Sb), an n-i-p structure is commonly used to enhance carrier collection and provide an effective "collection length," which is longer than the diffusion length; furthermore, thick n-i-p InGaAsN(Sb) and InGaAsN(Bi) junctions are highly sensitive to background doping levels, and those doping levels are strongly dependent on annealing conditions. 9,10 In some cases, annealing can convert the background doping from p-type to n-type, causing the p-n junction to be located at the back of the absorber and reducing the quantum efficiency. 9 Consequently, these subcells with materials having lower mobilities must be carefully considered within the context of operating characteristics of the complete device.…”
Section: Introductionmentioning
confidence: 99%
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