Effects of internal stresses on the mechanical properties of deposition thin films

Chuang, Chih-Pin; Chao, Ching‐Kong; Chang, Rwei Ching; Chu, Kuan-Ho

doi:10.1016/j.jmatprotec.2007.11.258

Cited by 38 publications

(19 citation statements)

References 13 publications

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“…This intrinsic stress plays an important role in tuning the physical 1-3 and mechanical 4 properties of the thin films and can be responsible for the failure of technologically important thin film devices. This intrinsic stress plays an important role in tuning the physical 1-3 and mechanical 4 properties of the thin films and can be responsible for the failure of technologically important thin film devices.…”

Section: Introductionmentioning

confidence: 99%

Compositional dependent thin film stress states

Thompson

2010

Journal of Applied Physics

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Articles you may be interested inStructure-stress-resistivity relationship in WTi alloy ultra-thin and thin films prepared by magnetron sputtering J. Appl. Phys. 113, 213504 (2013); 10.1063/1.4808240 Effect of adatom surface diffusivity on microstructure and intrinsic stress evolutions during Ag film growth J. Appl. Phys. 112, 043503 (2012); 10.1063/1.4746739 Kinetic model for dependence of thin film stress on growth rate, temperature, and microstructure J. Appl. Phys. 111, 083520 (2012); 10.1063/1.4704683Effect of initial stress/strain state on order-disorder transformation of FePt thin films This paper addresses in situ stress evolution of two-component Fe x Pt 1−x , where x spanned 0 to 1, alloy thin films. The stresses of the high-temperature, quenched-in, solid solution phase was determined by in situ wafer curvature measurements during ambient temperature growth. The measured stresses were shown to be compositional dependent and spanned both compressive and tensile stress states. Under specific growth conditions, a "zero-stress" state could be achieved. The alloy stress states did not show any significant stress recovery upon ceasing the deposition, i.e. the stress state during growth was retained in the film. X-ray diffraction, transmission electron microscopy, and atom probe tomography were used to characterize the microstructures of each thin film. The evolution of the stress state with composition is described in terms of a chemical potential term for preferential segregation of one species in the alloy to the grain boundaries.

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Section: Introductionmentioning

confidence: 99%

Compositional dependent thin film stress states

Thompson

2010

Journal of Applied Physics

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“…In this study the internal stress was composed of two factors since the sputtering parameters of the AlN films deposited on various substrate metals were the same [15]. The former was intrinsic stress due to the lattice mismatch between the film and substrate materials, while the latter was thermal stress due to the thermal expansion coefficient mismatch between them.…”

Section: As Shown Inmentioning

confidence: 99%

Influence of substrate metals on the crystal growth of AlN films

Xiong

et al. 2010

Int J Miner Metall Mater

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AlN films were deposited by reactive radio frequency (RF) sputtering on various bottom electrodes, such as Al, Ti, Mo, Au/Ti, and Pt/Ti. The effects of substrate metals on the orientation of AlN thin films were investigated. The results of X-ray diffraction, atomic force microscopy, and field emission scanning electron microscopy show that the orientation of AlN films depends on the kinds of substrate metals evidently. The differences of AlN films deposited on various metal electrodes are attributed to the differences in lattice mismatch and thermal expansion coefficient between the AlN material and substrate metals. The AlN film deposited on the Pt/Ti electrode reveals highly the c-axis orientation with well-textured columnar structure. The positive role of the Pt/Ti electrode in achieving the high-quality AlN films and high-performance film bulk acoustic resonator (FBAR) may be attributed to the smaller lattice mismatch as well as the similarity of thermal expansion coefficient between the deposited AlN material and the Pt/Ti electrode substrate.

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“…2b). The presence of residual stresses in the coatings is attributable to differences in the mechanical and thermal properties between the substrate and coatings and/or different phases in the coatings [29]. As shown in Fig.…”

Section: Resultsmentioning

confidence: 99%

Mechanical properties of Cr-alloyed MoSi2-based nanocomposite coatings with a hierarchical structure

et al. 2013

Journal of Alloys and Compounds

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a b s t r a c tNovel Cr-alloyed MoSi 2 -based nanocomposite coatings were successfully synthesized onto Ti-6Al-4V substrates by a double glow discharge plasma technique. The architecture of the nanocomposite coatings exhibited a hierarchical structure, consisting of equiaxed C40-MoSi 2 with a bimodal grain size distribution and strip-shaped Mo 5 Si 3 grains segregated to the boundaries of submicron MoSi 2 grains. The results showed that the toughness of the MoSi 2 -based nanocomposite coatings depended strongly upon their hierarchical structure and the magnitude of compressive residual stresses in the nanocomposite coatings.

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Effects of internal stresses on the mechanical properties of deposition thin films

Cited by 38 publications

References 13 publications

Compositional dependent thin film stress states

Compositional dependent thin film stress states

Influence of substrate metals on the crystal growth of AlN films

Mechanical properties of Cr-alloyed MoSi2-based nanocomposite coatings with a hierarchical structure

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