Jpn. J. Appl. Phys.
 2002
DOI: 10.1143/jjap.41.1915
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Effects of Macroscopic Pattern Density and O2Addition on Chamber Stability during Silicon Nitride Layer Etching in UNITY II-IEM Plasma Source

W. Back1,
Kil Ho Kim2,
Jong‐Il Kim3
et al.
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