1994
DOI: 10.1007/bf00578087
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Effects of metallic and D2EHPA impurities on nickel electrowinning from aqueous sulphate baths

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Cited by 24 publications
(5 citation statements)
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“…The measurements were conducted in a three-electrode cell with a saturated calomel electrode (B521, SI Analytics) as a reference electrode (RE), a 25 mm × 25 mm × 3 mm type 1 glassy carbon plate (Alfa Aesar) as counter electrode (CE), and PyC (pyrolyzed carbon) as a working electrode (WE). An IviumStat 24-bit CompactStat (Ivium, NL) was employed for the electrochemical measurements, and scanning electron microscope–energy dispersion spectroscopy, SEM-EDS (Leo 1450 VP, Zeiss, Germany, INCA-software, Oxford Instruments, UK) was used for the chemical analysis of the electrodes after each EDRR experiment, whereas a Mira 3 Tescan GM (Czech Republic) was used for higher magnification imaging. In addition, the components within the two industrial solution samples investigated were determined using either inductively couple plasma–optical emission spectroscopy or high resolution mass spectroscopy, ICP-OES/HR-MS (OES: Iris intrepid, Thermo Fisher Scientific, USA, and HR-MS: Nu AttoM, Nu Instruments Ltd., UK, housed at GTK, Espoo).…”
Section: Methodsmentioning
confidence: 99%
See 1 more Smart Citation
“…The measurements were conducted in a three-electrode cell with a saturated calomel electrode (B521, SI Analytics) as a reference electrode (RE), a 25 mm × 25 mm × 3 mm type 1 glassy carbon plate (Alfa Aesar) as counter electrode (CE), and PyC (pyrolyzed carbon) as a working electrode (WE). An IviumStat 24-bit CompactStat (Ivium, NL) was employed for the electrochemical measurements, and scanning electron microscope–energy dispersion spectroscopy, SEM-EDS (Leo 1450 VP, Zeiss, Germany, INCA-software, Oxford Instruments, UK) was used for the chemical analysis of the electrodes after each EDRR experiment, whereas a Mira 3 Tescan GM (Czech Republic) was used for higher magnification imaging. In addition, the components within the two industrial solution samples investigated were determined using either inductively couple plasma–optical emission spectroscopy or high resolution mass spectroscopy, ICP-OES/HR-MS (OES: Iris intrepid, Thermo Fisher Scientific, USA, and HR-MS: Nu AttoM, Nu Instruments Ltd., UK, housed at GTK, Espoo).…”
Section: Methodsmentioning
confidence: 99%
“…In hydrometallurgical industries, significant amounts of impurities and some additives are present in the base metal (Cu, Ni, Zn)-rich process solutions. The presence of such contaminants can be either detrimental to the process/base metal product or beneficial as they help improve process operation and feasibility.…”
Section: Introductionmentioning
confidence: 99%
“…for copper, nickel or zinc deposition on the permanent or seed plate cathode. Hydrometallurgical process streams differ typically from synthetic plating baths, as they contain a huge variety of base metal ions, impurities and also precious metal ions [8][9][10][11][12][13][14][15][16][17][18][19][20][21]. Typically, valuable metals such as Ag are present at ppb-ppm level, making their selective recovery challenging.…”
Section: Introductionmentioning
confidence: 99%
“…21 Once z E-mail: hjg.csu@gmail.com these hydrophobic ligands are entrained into the electrolytes, they could present the undesired effects on the following deposition process, such as appearance of the cracks, peels or pits on the deposit surface. [22][23][24][25][26] Hence, it's worthwhile to understand the effect of the hydrophobic ligands in the electrolytes on metal deposition, which will allow the morphologies of metal deposits to be better controlled.…”
mentioning
confidence: 99%