2010
DOI: 10.1016/j.surfcoat.2009.11.021
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Effects of nitrogen pressure and pulse bias voltage on the properties of Cr–N coatings deposited by arc ion plating

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Cited by 159 publications
(67 citation statements)
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“…During further increase of the substrate bias, Cr2N (111) becomes the dominant reflection. Changes of bias voltages may also cause reflection shifting in the XRD spectra, and such a peak shift to lower 2θ values was observed for Cr2N (110) with increasing bias voltage, related to the chemical composition change [24,42]. After hydrogenation, the intensities of the peaks of CrN and Cr2N phases changed.…”
Section: Crystalline Structurementioning
confidence: 99%
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“…During further increase of the substrate bias, Cr2N (111) becomes the dominant reflection. Changes of bias voltages may also cause reflection shifting in the XRD spectra, and such a peak shift to lower 2θ values was observed for Cr2N (110) with increasing bias voltage, related to the chemical composition change [24,42]. After hydrogenation, the intensities of the peaks of CrN and Cr2N phases changed.…”
Section: Crystalline Structurementioning
confidence: 99%
“…With increasing hydrogen concentration inside the coating, the compressive stresses usually increase due to hydrogen incorporation into the open volume defects Chu et al [49] found that the residual stress was clearly related to the negative bias voltages, and high hardness is a result of such high residual stress. The compressive stress arises because of a process called "atomic peening", in which some atoms squeeze into the lattices directly, causing internal stress and increasing the coating hardness [24,50]. However, further increase of the bias voltage can lead to reduced hardness, because the superfluous bombarding energies can cause lattice relaxation and recrystallization.…”
Section: Mechanical Propertiesmentioning
confidence: 99%
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“…For obtaining the accurate experiment values, the results were collected as an average of 20 measurement readings. Residual stress values were estimated through the stress tester machine (J&L Advanced Plasma Technology™, Ansan, Korea) that applied a laser and calculated with the Stoney equation [26].…”
Section: Composition and Deposition Ratementioning
confidence: 99%