1999
DOI: 10.1016/s0040-6090(98)01414-x
|View full text |Cite
|
Sign up to set email alerts
|

Effects of octa decyl thiol (ODT) treatment on the gallium arsenide surface and interface state density

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

1
23
0

Year Published

2000
2000
2009
2009

Publication Types

Select...
9

Relationship

0
9

Authors

Journals

citations
Cited by 18 publications
(24 citation statements)
references
References 16 publications
1
23
0
Order By: Relevance
“…[43] Most passivation strategies found in the literature employ inorganic or organic thiols, where sulfur is intended to bind covalently to the GaAs surface, but the stability of the adsorbed monolayers is often limited, in part due to their defective structure. [18,44] Our observations on self-assembled monolayers (SAMs) of ODT and MHDA are in accordance with earlier findings. [15,16,18,37] The ellipsometrically obtained thicknesses of 1.5 nm point to a tilted arrangement of the alkyl chains with respect to the surface normal, as has been previously reported.…”
Section: Discussionsupporting
confidence: 92%
“…[43] Most passivation strategies found in the literature employ inorganic or organic thiols, where sulfur is intended to bind covalently to the GaAs surface, but the stability of the adsorbed monolayers is often limited, in part due to their defective structure. [18,44] Our observations on self-assembled monolayers (SAMs) of ODT and MHDA are in accordance with earlier findings. [15,16,18,37] The ellipsometrically obtained thicknesses of 1.5 nm point to a tilted arrangement of the alkyl chains with respect to the surface normal, as has been previously reported.…”
Section: Discussionsupporting
confidence: 92%
“…The inherent ability of adsorbed monolayers to modify the physical and chemical properties of solid surfaces makes them attractive for the effective control of III-V semiconductors. [13][14][15][16][17][18][19] Hence, it has become increasingly imperative to accurately determine the stability of SAMs prepared a͒ Electronic mail: lapierr@mcmaster.ca by various methods, as well as to develop a better understanding of the reasons underlying the discrepancy in the reliability of the ensuing passivation. 10 Consequently, this novel passivation mechanism has demonstrated its relevance as a prospective means of preventing further chemical modification while at the same time maintaining the desired electronic properties of the underlying surface, especially in the case of nanoscale device structures for which there is a large surface-to-volume ratio.…”
Section: Introductionmentioning
confidence: 99%
“…Through these investigations, a common thread has been the use of sulfur, in the form of a sulfuric acid etching followed by treatment in solution with sodium sulfide, 1-4 ammonium sulfide, 3-8 organic alkanethiols, [9][10][11][12][13] or through electrochemical deposition. In most cases these studies were concerned with the stabilization of the surface for the modification of the Schottky barrier and improved performance of semiconductor devices.…”
Section: Introductionmentioning
confidence: 99%