2021
DOI: 10.3390/coatings11060698
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Effects of Oxygen Content on Operational Characteristics and Stability of High-Mobility IGTO Thin-Film Transistors during Channel Layer Deposition

Abstract: In this study, we investigated the effects of oxygen content on the transfer characteristics and stability of high-mobility indium-gallium-tin oxide (IGTO) thin-film transistors (TFTs) during channel layer deposition. The IGTO thin films were deposited through direct current sputtering at different ambient oxygen percentages of 10%, 20%, 30%, 40%, and 50%. The experimental results indicate that the drain currents were hardly modulated by the gate-to-source voltage in the IGTO TFT prepared at 10% ambient oxygen… Show more

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Cited by 10 publications
(2 citation statements)
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“…[ 30 ] Because such a photo‐transition leads to two delocalized free electrons into the conduction band, V th shifts to the negative direction. [ 31 ] V O creates both shallow and deep donor states in n‐type oxide semiconductors. The ionized shallow donors provide free electrons to the conduction band; therefore, there is Schottky junction between Bi 2 O 0.2 Se nanosheet and metallic electrodes.…”
Section: Resultsmentioning
confidence: 99%
“…[ 30 ] Because such a photo‐transition leads to two delocalized free electrons into the conduction band, V th shifts to the negative direction. [ 31 ] V O creates both shallow and deep donor states in n‐type oxide semiconductors. The ionized shallow donors provide free electrons to the conduction band; therefore, there is Schottky junction between Bi 2 O 0.2 Se nanosheet and metallic electrodes.…”
Section: Resultsmentioning
confidence: 99%
“…It is one of the research areas that remains up to date regarding features that are open to development [4,6,7]. Indium Zinc Oxide (InZnO) [8], Indium Tin Oxide (InSnO) [9], Zinc Tin Oxide (ZnSnO) [10], Indium Zinc Tin Oxide (InZnSnO) [11], Indium Gallium Tin Oxid (InGaSnO) [12], and Indium Gallium Zinc Oxide (InGaZnO) [13,14] can be given as examples of multi-cation transparent amorphous oxide semiconductors that have been researched and developed so far. Amorphous InGaZnO (a-IGZO), discovered by Nomura et al in 2004, has been one of the most promising materials in this field [14].…”
Section: Introductionmentioning
confidence: 99%