1998
DOI: 10.1117/12.328005
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Effects of post-implantation annealing on LWIR HgCdTe diode characteristics

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“…Âàaeëèâèì ôàêòîðîì äëÿ ôîðìóâàííÿ ÿê³ñíèõ p-n-ïåðå-õîä³â º ðàä³àö³éí³ äåôåêòè, à òàêîae ìåõàí³÷í³ íàïðóaeåííÿ, ÿê³ âèíèêàþòü â ³ìïëàíòîâàíîìó øàð³. Âëàñòèâîñò³ ³ ìåõàí³çìè ôîðìóâàííÿ p-n-ïåðåõîä³â â CdHgTe âèâ÷àëèñÿ â ðÿä³ ðîá³ò [6,[9][10][11]. Òàê ÿê ³îííà ³ìïëàíòàö³ÿ ïðîâîäèòüñÿ â åï³-òàêñ³éíèé øàð CdHgTe, òî îñíîâíèé ìåõàí³çì ôîðìóâàííÿ ëåãîâàíî¿ îáëàñò³ ïîëÿãຠâ òîìó, ùî ³îíè âèáèâàþòü àòîìè ðòóò³ ³ âñ³ ïåðåõîäÿòü ó ì³aeâóçëîâ³ àòîìè.…”
Section: ô ô ñèçîâ ç ô öèáðèé í â âóé÷èê å î áèëåâè÷ ì âunclassified
“…Âàaeëèâèì ôàêòîðîì äëÿ ôîðìóâàííÿ ÿê³ñíèõ p-n-ïåðå-õîä³â º ðàä³àö³éí³ äåôåêòè, à òàêîae ìåõàí³÷í³ íàïðóaeåííÿ, ÿê³ âèíèêàþòü â ³ìïëàíòîâàíîìó øàð³. Âëàñòèâîñò³ ³ ìåõàí³çìè ôîðìóâàííÿ p-n-ïåðåõîä³â â CdHgTe âèâ÷àëèñÿ â ðÿä³ ðîá³ò [6,[9][10][11]. Òàê ÿê ³îííà ³ìïëàíòàö³ÿ ïðîâîäèòüñÿ â åï³-òàêñ³éíèé øàð CdHgTe, òî îñíîâíèé ìåõàí³çì ôîðìóâàííÿ ëåãîâàíî¿ îáëàñò³ ïîëÿãຠâ òîìó, ùî ³îíè âèáèâàþòü àòîìè ðòóò³ ³ âñ³ ïåðåõîäÿòü ó ì³aeâóçëîâ³ àòîìè.…”
Section: ô ô ñèçîâ ç ô öèáðèé í â âóé÷èê å î áèëåâè÷ ì âunclassified