Effects of preirradiation and thermal annealing on photoinduced defects creation in synthetic silica glass

Abstract

Defect structure of carbon rich a -SiC:H films and the influence of gas and heat treatments Effects of preirradiation by ArF-excimer laser and thermal annealing on photoinduced defects creation in synthetic silica glass were investigated by optical absorption measurements. It has been confirmed that the durability for ArF-excimer laser irradiation can be improved by the preirradiation followed by annealing. The absorption spectra strongly suggest that a dominant role of the preirradiation should be to assist relaxations of weak parts in the glass such as strained Si-O-Si bonds. Furthermore, the photoinduced defects creation can be divided into two processes, and the preirradiation only suppresses the photoinduced defects creation in the first process.

Defect Induced by Heated Treatment in Silica Fiber Material

“…It has been well known that there are four basic point defects in silica glasses, which are E' centers, NBOHCs, peroxy radicals, and self-trapped holes. These defects can be decreased when the synthetic silica was treated by pre-irradiation and subsequent thermal annealing [9,10]. Thermal treatment process also can produce various defects, which are induced typically in optical fibers [11,12].…”

Influences of Thermal Annealing Temperatures on Irradiation Induced $E^{\prime}$ Centers in Silica Glass

“…Griscom has shown that the defect centers can be decreased when the synthetic silica was irradiated by rays and then annealing [9]. Saito glass [10]. They found that defect centers induced by ultraviolet (UV) light in bulk silica glass can be reduced by pre-irradiation and thermal annealing.…”