Effects of RF Power and Treatment Time on Wettability of Oxygen Plasma-Treated Diamond-like Carbon Thin Films

Abstract

Abstract-Diamond-like carbon (DLC) thin films can be used in numerous industrial applications, including biomedical modified-surfaces with biocompatible and wetting properties. It is important to understand the surface properties of DLC thin films for these applications. In this study, oxygen (O 2 ) plasma treatment on DLC film surfaces is studied, taking into account the effects of radio frequency (RF) power and treatment time on wetting property. All the films were prepared on Si (100) wafers using a plasma-based ion implantation (PBII) technique using acetylene (C 2 H 2 ) as the plasma source. The deposited DLC films were then treated with oxygen plasma using various RF powers and treatment times in order to characterize the wettability, compared to as-deposited DLC film. The thickness and structure of the films were evaluated using stylus profilometer and Raman spectroscopy. The wettability of the films was assessed using a contact angle meter. The results indicate the oxygen plasma treatment on DLC film surfaces influenced to thickness change, but unaffected to structure of the films with various RF powers and treatment times. Further, oxygen plasma-treated DLC films exhibit a hydrophilic surface due to the introduction of some hydroxyl and carbonyl groups onto the DLC film surface. It is concluded that oxygen plasma treatment can be used to make hydrophilic DLC, making it a favorable wetting surface for biomedical applications.

The effect of LFG plasma sputtering power on hardness of carbon thin films on SKD11 steel using target material from battery carbon rods

“…A similar study about the effect of plasma sputtering RF power on diamond-like carbon thin films was previously had been carried out by Jongwannasiri et al Based on the results of the study showed plasma treatment on DLC films surface influenced to thickness change, but not affect to structure of the films with various RF powers [24]. However, the limitation of this result didn't discuss about the effect of various plasma power on hardness of DLC films and only discuss the thickness of DLC films.…”

Enhanced Magneto-Optic Properties in Sputtered Bi- Containing Ferrite Garnet Thin Films Fabricated Using Oxygen Plasma Treatment and Metal Oxide Protective Layers

“…On the other hand, oxygen plasma treatment is an attractive and widely used technique on both the experimental and industrial scales to improve thin-film technology without introducing any complexity into the material stoichiometry [ 22 , 23 , 24 ]. Oxygen plasma treatment is a well-known method used to clean the substrates for the development of thin films, since the oxygen plasma treatment enhances the adhesion of thin films to the substrates.…”

“…Oxygen plasma treatment is a well-known method used to clean the substrates for the development of thin films, since the oxygen plasma treatment enhances the adhesion of thin films to the substrates. The optimized oxygen plasma treatment process can enhance the thin film’s bonding strength (surface energy) and adequately modify the film surfaces for various microelectronics and optoelectronics devices without affecting the entire nanostructure of the devices [ 22 , 23 , 24 , 25 , 26 , 27 ]. J. W. Roh et al have reported that the oxygen plasma- assisted wafer bonding process is very effective and crucial for the fabrication of integrated optical waveguide isolators.…”

Enhancement Magneto-optic Properties of Radio-Frequency-Magnetron-sputtered Bi-containing Ferrite Garnet-Type Thin-films using Oxygen plasma treatment and metal-oxide protective layers

“…On the other hand, oxygen plasma treatment is an attractive and widely used technique on both the experimental and industrial scales to improve thin-film technology without having any complexity into the material stoichiometry [19][20][21]. Oxygen plasma treatment is a well-known method used to clean the substrates for the development of thin films as the oxygen plasma treatment enhances the adhesion of the thin films to the substrates.…”

“…Oxygen plasma treatment is a well-known method used to clean the substrates for the development of thin films as the oxygen plasma treatment enhances the adhesion of the thin films to the substrates. The optimized oxygen plasma treatment can enhance the thin film's bonding strength (surface energy) and adequately modify the film surfaces for various microelectronics and optoelectronics devices without affecting the entire nanostructures of the devices [19][20][21][22][23][24]. J. W. Roh et al have reported that the oxygen plasma assisted wafer bonding process is very effective and crucial for the fabrication of integrated optical waveguide isolators.…”