Effects of substrate properties and sputtering methods on self-formation of Ag particles on the Ag–Mo(Zr) alloy films

Abstract

This article studies two different sputtering methods for depositing Ag–Mo and Ag–Zr alloy films on single crystal silicon (Si), flexible polyimide (PI) and soda-lime glass substrates. The phase structure and the surface morphology of the Ag–Mo(Zr) alloy films were characterized by XRD, SEM and EDS. The effects of substrate properties and sputtering methods on the self-grown Ag particles on the Ag–Mo(Zr) alloy films were investigated. As the result of the experiment, nanoscale Ag particles were formed on the surface of Ag–Mo(Zr) alloy films. However, the size and the number of self-formed Ag particles on the Ag–Mo(Zr) alloy film on the PI substrate are significantly different from that on the Si substrate and glass substrate. This outcome is closely related to the different thermal stress evolution behaviors of the alloy films on different substrates during annealing.

Effect of microstructural evolution on mechanical and electrical properties of Ag–Mo thin films

“…Ag atoms with higher mobility than Mo are sufficient to overcome the diffusion length needed to form the Ag particle [19]. This trend is consistent with the formation of self-assembling Ag particles on the surface of the Ag-Mo film [35].…”

“…Ag atoms with higher mobility than Mo are sufficient to overcome the diffusion length needed to form the Ag particle [19]. This trend is consistent with the formation of self-assembling Ag particles on the surface of the Ag–Mo film [35].

Figure 5 Representative cross-sectional TEM images and corresponding SAED patterns of films with different compositions: (a) Ag-53 at.% Mo and (c) Ag-86 at.% Mo.

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