2015
DOI: 10.1016/j.apsusc.2015.09.173
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Effects of surface non-stoichiometry on the electronic structure of ultrathin NiO(0 0 1) film

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Cited by 18 publications
(3 citation statements)
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“…It was shown that under Ar + sputtering over long duration (15 min), the Ni 2p 3/2 peak shifts to 854.6 eV corresponding to metallic Ni. 45 Chen et al reported the Ni 2p 3/2 peak located at 855.6 eV in the core− shell Ni(OH) 2 @CoOOH composites corresponding to the Ni(II) oxidation state. 46 Dubal et al reported the Ni 2p 3/2 peak located at 855.8 eV for Ni(OH) 2 nanoparticles grown onto carbon nanotubes.…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…It was shown that under Ar + sputtering over long duration (15 min), the Ni 2p 3/2 peak shifts to 854.6 eV corresponding to metallic Ni. 45 Chen et al reported the Ni 2p 3/2 peak located at 855.6 eV in the core− shell Ni(OH) 2 @CoOOH composites corresponding to the Ni(II) oxidation state. 46 Dubal et al reported the Ni 2p 3/2 peak located at 855.8 eV for Ni(OH) 2 nanoparticles grown onto carbon nanotubes.…”
Section: Resultsmentioning
confidence: 99%
“…They used Ar + bombardment on an ultrathin NiO film to eliminate oxygen atoms by inert ions and increase the number of oxygen vacancy sites over time. It was shown that under Ar + sputtering over long duration (15 min), the Ni 2p 3/2 peak shifts to 854.6 eV corresponding to metallic Ni . Chen et al reported the Ni 2p 3/2 peak located at 855.6 eV in the core–shell Ni­(OH) 2 @CoOOH composites corresponding to the Ni­(II) oxidation state .…”
Section: Resultsmentioning
confidence: 99%
“…Furthermore, this decomposition behavior typically occurs from the upper surface of the films, which is evident from the thickness dependent decomposition process [21]. Das et al [24] have also demonstrated that the creation of oxygen vacancies at the freshly deposited NiO film surface by ultrahigh vacuum annealing is more effective in case of thinner NiO films. These results further confirm that there is a critical thickness, which is currently 100 nm, for the decomposition reaction under vacuum annealing conditions.…”
Section: Structural Properties Of Nio Thin Filmmentioning
confidence: 96%