Effects of temperature on the dissociative electron attachment to N2O

Brüning, Frank; Matejčík, Štefan; Illenberger, Eugen; Chu, Yan-nan; Senn, G.; Muigg, D.; Denifl, G.; Märk, T.D.

doi:10.1016/s0009-2614(98)00658-7

Cited by 37 publications

(39 citation statements)

References 27 publications

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“…For energetic reasons, the ions can only be O À . The spectrum on the left resembles closely the spectra of Chantry (1969), Bru¨ning et al (1998) and Krishnakumar and Srivastava (1990). The detail of the spectrum on the right reveals that what initially appeared as a continuous band consists in reality of narrow peaks (vibrational Feshbach resonances VFR), whose spacings and positions are related to the bending vibration of N 2 O.…”

Section: C Nitrous Oxidementioning

confidence: 66%

Resonance and Threshold Phenomena in Low-Energy Electron Collisions with Molecules and Clusters

Hotop

Ruf

Allan

et al. 2003

Advances in Atomic, Molecular, and Optical Physics

269

229

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Section: C Nitrous Oxidementioning

confidence: 66%

Resonance and Threshold Phenomena in Low-Energy Electron Collisions with Molecules and Clusters

Hotop

Ruf

Allan

et al. 2003

Advances in Atomic, Molecular, and Optical Physics

269

229

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“…These interactions are responsible of the high value of G LEE . Electron attachment to gas-phase N 2 O has been studied extensively (Galuska et al, 2005;Hayakawa et al, 1986;Schulz, 1961;Brüning et al, 1998;Rapp and Briglia, 1965). Such studies show that dissociative electron attachment (DEA) to nitrous oxide leads to the formation of O − via e − + N 2 O → N 2 + O − ( 3 P) with a large electron capture cross section relative to that of O 2 .…”

Section: Discussionmentioning

confidence: 99%

Induction of strand breaks in DNA films by low energy electrons and soft X-ray under nitrous oxide atmosphere

Alizadeh

Sanche

2012

Radiation Physics and Chemistry

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Five-monolayer (5ML) plasmid DNA films deposited on glass and tantalum substrates were exposed to Al K α X-rays of 1.5 keV under gaseous nitrous oxide (N 2 O) at atmospheric pressure and temperature. Whereas the damage yields for DNA deposited on glass are due to soft X-rays, those arising from DNA on tantalum are due to both the interaction of low energy photoelectrons from the metal and X-rays. Then, the differences in the yields of damage on glass and tantalum substrates, essentially arises from interaction of essentially low-energy electrons (LEEs) with DNA molecules and the surrounding atmosphere. The G-values (i.e., the number of moles of product per Joule of energy absorbed) for DNA strand breaks induced by LEEs (G LEE ) and the lower limit of G-values for soft X-ray photons (G XL ) were calculated and the results compared to those from previous studies under atmospheric conditions and other ambient gases, such as N 2 and O 2 . Under N 2 O, the G-values for loss of supercoiled DNA are 103±15 nmol/J for X-rays, and 737±110 nmol/J for LEEs. Compared to corresponding values in an O 2 atmosphere, the effectiveness of X-rays to damage DNA in N 2 O is less, but the G value for LEEs in N 2 O is more than twice the corresponding value for an oxygenated environment. This result indicates a higher effectiveness for LEEs relative to N 2 and O 2 environments in causing SSB and DSB in an N 2 O environment. Thus, the previously observed radiosensitization of cells by N 2 O may not be only due to OH • radicals but also to the reaction of LEE with N 2 O molecules near DNA. The previous experiments with N 2 and O 2 and the present one demonstrate the possibility to investigate damage induced by LEEs to biomolecules under various type of surrounding atmospheres.

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“…Whereas numerous studies exist on the electron attachment to the N 2 O monomer (see for instance the recent paper [10] and references given therein) and on the electron impact ionization of gaseous N 2 O (see for instance all the appearance measurements listed in [11]), the number of previous studies concerning the interaction of free electrons with N 2 O clusters is very limited. On the one hand, Linn and Ng [12] measured the ionization threshold of the (N 2 O) ϩ 2 dimer ion in a photoionization mass spectrometric (PIMS) study to lie at 12.35Ϯ 0.02 eV and on the other hand Hertel and co-workers reported ionization energies as a function of N 2 O clusters size (up to n ϭ 22) [13,14] based on PIMS (photon ionization mass spectrometry) and TPEPICO (threshold photoelectron photoion coincidence) studies.…”

Section: Introductionmentioning

confidence: 99%

High Resolution Electron Ionization of N2O Clusters: Appearance Energies

Hanel¹,

Fiegele²,

Stamatovic³

et al. 2000

Zeitschrift Für Physikalische Chemie

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Appearance Energy / Electron Impact Ionization / N 2 O ClustersElectron ionization cross sections for (N 2 O) n clusters have been investigated near the threshold with a newly constructed crossed beams apparatus using a hemispherical electron monochromator (HEM) to monochromatize the primary electron beam. Exploratory test measurements including electron attachment studies to CCl4 and CO and appearance energy (AE) determinations for some rare gases (Ar, Kr, Xe) and molecules (N2, O2, N2O, O 3 ) measured for calibration purposes showed that the accuracy of the energy scale is better than 10 meV exhibiting a good linearity and that AE's derived for these compounds agree within 20 meV with known photoionization data when using a novel data handling procedure (involving a simultaneous non-linear weighted least-squares fit of two functions).Comparison of the presently derived appearance energies with earlier photoionization data shows a distinct difference in corresponding values attributed to different ionization mechanisms. Both data sets can be fitted successfully by a n Ϫ1/3 dependence yielding by extrapolation a value for the bulk photoelectric threshold (11.25 eV in the case of the photoionization data).

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Effects of temperature on the dissociative electron attachment to N2O

Cited by 37 publications

References 27 publications

Resonance and Threshold Phenomena in Low-Energy Electron Collisions with Molecules and Clusters

Resonance and Threshold Phenomena in Low-Energy Electron Collisions with Molecules and Clusters

Induction of strand breaks in DNA films by low energy electrons and soft X-ray under nitrous oxide atmosphere

High Resolution Electron Ionization of N2O Clusters: Appearance Energies

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