2009
DOI: 10.1016/j.apsusc.2009.06.004
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Effects of the annealing duration of the ZnO buffer layer on structural and optical properties of ZnO rods grown by a hydrothermal process

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Cited by 32 publications
(13 citation statements)
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“…The result may be due to the release of intrinsic strain induced by the presence of residual strain resulting from imperfections within the crystalline lattice, including vacancies, stacking faults, and interstitials. According to Shin et al [7], the lattice mismatch between ZnO film and Si-substrate causes structural defects. Thus, annealing the ZnO film deposited on Si-substrate removes the intrinsic strain because the Zn and O atoms are perfectly stacked in order.…”
Section: Resultsmentioning
confidence: 99%
“…The result may be due to the release of intrinsic strain induced by the presence of residual strain resulting from imperfections within the crystalline lattice, including vacancies, stacking faults, and interstitials. According to Shin et al [7], the lattice mismatch between ZnO film and Si-substrate causes structural defects. Thus, annealing the ZnO film deposited on Si-substrate removes the intrinsic strain because the Zn and O atoms are perfectly stacked in order.…”
Section: Resultsmentioning
confidence: 99%
“…By contrast, Chemical Vapour Deposition, has been poorly investigated despite it represents a low cost, viable, easily and tuneable, conformal route. Some systematic studies have investigated effects of thermal annealing treatments of MOCVD ZnO buffer layers in the perspective of improving the properties of the subsequently deposited CBD ZnO main layer [16,17]. Nevertheless, systematic effects upon varying MOCVD parameters have not been scrutinised.…”
Section: Zno Buffer Layer Mocvd Depositionmentioning
confidence: 99%
“…Similarly, the decomposition of zinc acetate has been proposed to produce nucleation sites for ZnO nanowires [8,9]. Moreover, it has been shown that pre-coating of glass and silicon substrates via sol-gel/spin coating [9][10][11][12][13], annealing of either Radio Frequency (RF) sputtered [14] or Metal-Organic Chemical Vapour Deposition (MOCVD) [15][16][17] deposited seed layers enhances texturing and crystallinity and is crucial for the formation of aligned ZnO nanowire/nanorod overlayers with improved properties.…”
Section: Introductionmentioning
confidence: 99%
“…12 Temperature also plays an important role in the formation of TiO 2 thin films, as it determines the nucleation and growth of nanostructures. 13 There are few works were carried out on the influence of molarity on the TiO 2 thin films and study the effects on structural, optical and electrical properties of films with optimized conditions.…”
Section: Introductionmentioning
confidence: 99%