2011
DOI: 10.1016/j.apsusc.2010.09.049
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Effects of the Hf content on the microstructure and magnetic properties of Co–Hf–Ta thin films

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Cited by 4 publications
(2 citation statements)
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“…In brief, magnetic thin films are considered as the potential candidate for thin-film inductors with an aim to improve their M s , H k , ρ, and also compatibility with semiconductor manufacturing processes. Therefore, tremendous efforts have been devoted to developing better magnetic thin films over past decades [3][4][5][6][7][8][9][10][11][12][13][14][15][16][17][18][19].…”
Section: Introductionmentioning
confidence: 99%
“…In brief, magnetic thin films are considered as the potential candidate for thin-film inductors with an aim to improve their M s , H k , ρ, and also compatibility with semiconductor manufacturing processes. Therefore, tremendous efforts have been devoted to developing better magnetic thin films over past decades [3][4][5][6][7][8][9][10][11][12][13][14][15][16][17][18][19].…”
Section: Introductionmentioning
confidence: 99%
“…To improve the most important characteristics (f r ,µ, eddy current loss) of the soft magnetic films , many works have been reported. Magnetic metal-insulator granular films (MIGF) such as FeCoB-N x O y (NxOy =SiO 2 ,Al 2 O 3 ,etc) show both good soft magnetic properties and high ρ, as their unique microstructure with dielectric amorphous phase were random embedded in nano-sized ferromagnetic particles [8][9][10][11].Many transition metal elements ,such as Nb, Zr, Hf, Mo ,Ta, Ti etc, which can tailor the M s , coercive force (H c ), H k and ρ by affecting the microstructure and stress of the soft magnetic films ,have been adopted into soft films [12][13][14][15][16][17][18][19][20][21][22][23].In this paper,We tried to adopt these elements into Fe 40 Co 40 B 20 -Al 2 O 3 films and the soft magnetic and microwave magnetic characteristics of these films were studied. The effects of annealing treatment on the magnetic properties of the films were also reported at the end of this paper.…”
Section: Introductionmentioning
confidence: 99%