2014
DOI: 10.1016/j.materresbull.2014.08.021
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Effects of thermal treatment on the Mg x Zn 1−x O films and fabrication of visible-blind and solar-blind ultraviolet photodetectors

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Cited by 12 publications
(7 citation statements)
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“…That means most radicals did not have enough time to reach their energy‐minimum sites, and thus were unable to form single‐phased Mg x Zn 1− x O films. It has also been reported that the absorption cutoff edges of Mg x Zn 1− x O films shifted to long wavelengths after thermal annealing treatment, and the shift was more obvious in films with higher Mg content . The effect could be ascribed to the diffusion of Zn atoms gathering at the film surface during the thermal treatment process, which led to the absorption of DUV light occurring mainly at the film surface.…”
Section: Mgxzn1−xomentioning
confidence: 91%
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“…That means most radicals did not have enough time to reach their energy‐minimum sites, and thus were unable to form single‐phased Mg x Zn 1− x O films. It has also been reported that the absorption cutoff edges of Mg x Zn 1− x O films shifted to long wavelengths after thermal annealing treatment, and the shift was more obvious in films with higher Mg content . The effect could be ascribed to the diffusion of Zn atoms gathering at the film surface during the thermal treatment process, which led to the absorption of DUV light occurring mainly at the film surface.…”
Section: Mgxzn1−xomentioning
confidence: 91%
“…Mg x Zn 1−x O alloy thin films with varied Mg contents have been successfully prepared with various techniques including PLD, [136][137][138] MOCVD, [139,140] magnetron sputtering, [141][142][143][144][145] plasma-assisted MBE, [146,147] etc. During the growing period, sapphire or quartz wafer are often employed as growing substrates.…”
Section: Photoconductorsmentioning
confidence: 99%
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“…[36] Then they investigated the influences of different growth conditions (growth temperature, Zn cell temperature, oxygen flow rate and RF power) on the performances of the three layers (ZnO nucleation layers, ZnO buffer layers and w-ZnMgO layers). [42] In order to improve the performance of w-ZnMgO photodetector, various methods have been selected in recent five years, such as the post-annealing process, [40,41] the new electrode structure, [42] surface treatment, [43] etc. [44,45] Hou et al have improved the peak responsivity of w-ZnMgO photodetector from 0.22 A/W to 1 A/W by 400 • C annealing in argon atmosphere.…”
Section: Wurtzite-znmgo Photodetectorsmentioning
confidence: 99%
“…In Mg x Zn 1−x O the band gap is shifted to higher energies and Cd x Zn 1−x O to lower energies compared to ZnO [4,5]. Within the latter few years, different physical deposition techniques have been used for the deposition of Cd x Zn 1−x O thin films such as RF reactive magnetron sputtering [9,10], thermal evaporation [11], plasma-assisted molecular beam epitaxy and pulsed laser deposition [12,13]. Moreover, as a semiconductor material, Mg x Zn 2+ and Zn 2+ ions respectively.…”
Section: Introductionmentioning
confidence: 99%