“…ZnO films have been deposited by using a variety of methods like SOL-GEL [6], spray pyrolysis [7], magnetron sputtering [8], pulsed laser deposition (PLD) [9], molecular beam epitaxy (MBE) [10] and metal-organic chemical vapour deposition (MOCVD) [11]. In addition, it has been reported recently [12] the deposition of high quality ZnO films on Si substrates by metal Zn evaporation and post annealing (oxidation) in ambient conditions at low temperature (410 ºC), with obvious advantages like low cost, inexpensive equipment, and the inherent simplicity of the technique.…”