Effects of Ti content on microstructure, mechanical and tribological properties of Ti-doped amorphous carbon multilayer films

Bai, W.Q.; Li, L.L.; Wang, X.L.; He, Fan; Liu, D.G.; Jin, Gong; Tu, Jiangping

doi:10.1016/j.surfcoat.2015.02.024

Cited by 62 publications

(26 citation statements)

References 64 publications

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“…This shortcoming can be surpassed by using Ti-based composites, thereby producing a highly reliable joint structure. [2] For instance, Ti embedded in a carbon (C) matrix could improve adherence of the coated substrates to obtain better hardness and anticorrosive properties [3]. This is why the relationship between structural and mechanical properties of nanocrystalline TiC/amorphous C thin films had increased a great interest.…”

Section: Introductionmentioning

confidence: 99%

NANOSTRUCTURED Ti-C THIN FILMS DEPOSITED BY THERMIONIC VACUUM ARC (TVA) TECHNOLOGY

CIUPINA¹,

Vladoiu²,

Lungu³

et al. 2022

AnnalsARSciPhysChem

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Nanostructured titanium-carbon nanostructured thin films were prepared using the Thermionic Vacuum Arc (TVA) technology in different configurations under a varied number of Ti/C combinations at high base pressure of 1 x 10-6Torr with and without graded compositions. The layers consisting of about lOOnm Carbon base layer and seven 40nm alternatively Ti and C layers were deposited on Silicon substrates. On the other hand, in order to obtain C-Ti multilayer structures with variable thickness and different percentages in C and Ti oflayers, a 20nm thick C layer was first deposed on Si substrate and then seven Ti-C layers, each ofthese having thickness of up to 40nm were deposed. To perform the successively layers with various thickness were changed the discharge parameters for C and Ti plasma sources to obtain the desirable thickness. By changing ofsubstrate temperature between room temperature and 300°C and on the other hand the bias voltage up to -700V, different batches of samples were obtained for this study. The films were characterized by surface morphology, and microstructure, through Rutherford Backscattering Spectrometry (RBS), Raman Spectroscopy, Transmission Electron Microscopy (TEM), Grazing Incidence X-ray diffraction (GIXRD). Tribological and electrical measurements are also presented.

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Section: Introductionmentioning

confidence: 99%

NANOSTRUCTURED Ti-C THIN FILMS DEPOSITED BY THERMIONIC VACUUM ARC (TVA) TECHNOLOGY

CIUPINA¹,

Vladoiu²,

Lungu³

et al. 2022

AnnalsARSciPhysChem

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“…Moreover, in wear conditions, the incorporation of silver (Ag) into titanium (Ti) compounds can change their properties by acting as a solid lubricant [5][6][7]. Ti embedded in a carbon (C) matrix could improve adherence of the coated substrates to obtain better hardness and anticorrosive properties [8,9].…”

Section: Introductionmentioning

confidence: 99%

Synthesis and Characterization of Complex Nanostructured Thin Films Based on Titanium for Industrial Applications

et al. 2020

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Titanium-based composites—titanium and silver (TiAg) and titanium and carbon (TiC)—were synthesized by the Thermionic Vacuum Arc (TVA) method on substrates especially for gear wheels and camshaft coating as mechanical components of irrigation pumps. The films were characterized by surface morphology, microstructure, and roughness through X-ray Diffraction (XRD), Atomic Force Microscopy (AFM), Scanning Electron Microscopy (SEM), Transmission Electron Microscopy (TEM), and Small-Angle Neutron Scattering (SANS). The silver (Ag) films crystallized into a cubic system with lattice a = 4.0833 Å at room temperature, indexed as cubic Ag group Fm3m. The crystallites were oriented in the [111] direction, and mean grain size was <D>111 = 265 Å. The TiC structure revealed a predominant cubic TiC phase, with a = 0.4098 as a lattice parameter determined by Cohen’s method. Average roughness (Ra) was 8 nm for the as-grown 170 nm thick TiAg film, and 1.8 nm for the as-grown 120 nm thick TiC film. Characteristic SANS contribution was detected from the TiAg layer deposited on a substrate of high-quality stainless steel with 0.45% carbon (OLC45) in the range of 0.015 Å−1 ≤ Q ≤ 0.4 Å−1, revealing the presence of sharp surfaces and an averaged triaxial ellipsoidal core-shell object.

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“…However, DLC has low adhesion due to the internal stress of the films [3]. For this reason, metal (Ti, Ta, Cr) or nonmetal (N2, B) is doped to increase adhesion [4][5][6][7][8]. Ta is a chemically stable, highly melting and biocompatible element.…”

Section: Introductionmentioning

confidence: 99%

“…When the literature is searched, the parameters affecting the adhesion of DLC films are target current, substrate bias voltage, gas content. In addition, parameters affecting adhesion in HiPIMS system are duty cycle, target voltage, gas content and substrate bias voltage [5,[17][18][19].…”

Section: Introductionmentioning

confidence: 99%

Determining Optimum Parameters for Adhesion Properties of Ta-DLC Films Using Taguchi Experimental Design

Efeoğlu

2019

BEN

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DLC films have high biocompatibility. But due to low adhesion, the element must be doped. Therefore, in this study, the high biocompatibility Ta element was doped into DLC film and optimum parameters for the adhesion of Ta-DLC films were determined. The Taguchi experimental system was used to determine the optimum parameters. Ta target current, substrate bias voltage and duty cycle were selected as variable parameters. The deposition was performed with HiPIMS-CFUBMS system. Ta-DLC films were grown on Ti6Al4V substrates using Taguchi L9 34 orthogonal experimental system. The optimum deposition parameters for critical load of Ta-DLC films are 3A, -80V and %5 for Ta target current, substrate bias voltage and duty cycle, respectively.

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Effects of Ti content on microstructure, mechanical and tribological properties of Ti-doped amorphous carbon multilayer films

Cited by 62 publications

References 64 publications

NANOSTRUCTURED Ti-C THIN FILMS DEPOSITED BY THERMIONIC VACUUM ARC (TVA) TECHNOLOGY

NANOSTRUCTURED Ti-C THIN FILMS DEPOSITED BY THERMIONIC VACUUM ARC (TVA) TECHNOLOGY

Synthesis and Characterization of Complex Nanostructured Thin Films Based on Titanium for Industrial Applications

Determining Optimum Parameters for Adhesion Properties of Ta-DLC Films Using Taguchi Experimental Design

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