2022
DOI: 10.1039/d2ra02247h
|View full text |Cite
|
Sign up to set email alerts
|

Effects of Ti-doping amount and annealing temperature on electrochromic performance of sol–gel derived WO3

Abstract: Fine-control of structural properties of WO3. Faster and balanced charge transfer kinetics. Higher coloration efficiency.

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2

Citation Types

0
2
0

Year Published

2023
2023
2024
2024

Publication Types

Select...
4

Relationship

0
4

Authors

Journals

citations
Cited by 4 publications
(2 citation statements)
references
References 50 publications
0
2
0
Order By: Relevance
“…15,16 Common deposition processes for these layers involve techniques such as chemical vapor deposition, e-beam evaporation, and sputtering, while electrodeposition, solvothermal, and sol–gel methods are popular choices among solution-based processes. 17–21 Solution processes offer significant advantages over the others due to allowing the use of low-cost equipment and enabling bulk production in a shorter time frame. Moreover, they facilitate the production of desired nanostructures with large surface areas, thereby promoting high electrochemical performance.…”
Section: Introductionmentioning
confidence: 99%
“…15,16 Common deposition processes for these layers involve techniques such as chemical vapor deposition, e-beam evaporation, and sputtering, while electrodeposition, solvothermal, and sol–gel methods are popular choices among solution-based processes. 17–21 Solution processes offer significant advantages over the others due to allowing the use of low-cost equipment and enabling bulk production in a shorter time frame. Moreover, they facilitate the production of desired nanostructures with large surface areas, thereby promoting high electrochemical performance.…”
Section: Introductionmentioning
confidence: 99%
“…As a result, the material absorbs the incident light and emits blue light according to the energy gap . WO 3 films can be deposited by various techniques, such as chemical vapor deposition, sputtering, thermal evaporation, electron beam evaporation, hydrothermal processes, spray pyrolysis, sol–gel processes, etc. Among them, sputtering is an industrially adaptable process, as the surface morphology, crystal structure, chemical composition, and electrical properties can be controlled by various parameters, such as the pressure, oxygen content, temperature, deposition time, etc.…”
Section: Introductionmentioning
confidence: 99%