2013
DOI: 10.1007/s11249-013-0276-x
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Effects of Vapor Environment and Counter-Surface Chemistry on Tribochemical Wear of Silicon Wafers

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Cited by 13 publications
(12 citation statements)
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“…In atomic force microscopy (AFM) experiments, the amorphous SiO 2 was shown to be worn with a SiO 2 tip under a low load, while a diamond tip, which is chemically inert yet harder than the SiO 2 , was unable to wear the Si wafer coated with native oxide under a similar load [118,119]. These results suggested that the chemistry of the SiO 2 surfaces contributes to the wear of the material at loads lower than the hardness value causing mechanical deformation of the material.…”
Section: Environmental Effect On Friction and Wear Of Oxides And Glassesmentioning
confidence: 99%
“…In atomic force microscopy (AFM) experiments, the amorphous SiO 2 was shown to be worn with a SiO 2 tip under a low load, while a diamond tip, which is chemically inert yet harder than the SiO 2 , was unable to wear the Si wafer coated with native oxide under a similar load [118,119]. These results suggested that the chemistry of the SiO 2 surfaces contributes to the wear of the material at loads lower than the hardness value causing mechanical deformation of the material.…”
Section: Environmental Effect On Friction and Wear Of Oxides And Glassesmentioning
confidence: 99%
“…This tribochemical wear of silicon occurs only with the existence of water molecules [13]. When the alcohol vapor was introduced into the AFM chamber, the adsorbed alcohol molecules could form a lubrication layer and protect the silicon substrate [21][22][23][24][25].…”
Section: Lubrication Of Adsorbate Ethanol Layermentioning
confidence: 99%
“…It was reported that the alcohol vapor could successfully prevent the silicon wear when the full coverage of alcohol layer was formed on substrate surface [21,25]. In that case, due to the lubrication of adsorbate alcohol layer, the friction coefficient would be consistent with 0.2 whether the tests were operated in AFM and MEMS devices at nano/micro-scale or in pin-on-disc tribometers at macro-scale [21][22][23][24][25]44,45]. However, the tribochemical wear of silicon was found to be completely suppressed at relatively low P a /P sat (o30%) where a partial coverage of ethanol adsorbate layer was expected on silicon surface (For example: Fig.…”
Section: 2mentioning
confidence: 99%
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“…For example, the nanowear results of silicon surfaces could vary significantly when rubbing against different countersurfaces [14][15][16]. A deep wear of silicon in humid environments occurred only when the counter-surface was SiO 2 , while a hillock formation on the silicon substrate was observed when the counter-surface was diamond [14].…”
Section: Introductionmentioning
confidence: 99%