2008
DOI: 10.1016/j.matlet.2007.08.042
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Effects of water on the structure and properties of F-doped SnO2 films

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Cited by 26 publications
(14 citation statements)
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“…Research reported by Zhao et al [14] on the effects of water on the APCVD produced SnO 2 :F (no cell data) interestingly showed the inverse effect of larger feature sizes at higher water content, with increased compactness of the surface, suggesting increased smoothness (Roughness values were not given). They also stated that the film thickness and hence growth rate increased.…”
Section: Tco Thin Film Analysismentioning
confidence: 95%
“…Research reported by Zhao et al [14] on the effects of water on the APCVD produced SnO 2 :F (no cell data) interestingly showed the inverse effect of larger feature sizes at higher water content, with increased compactness of the surface, suggesting increased smoothness (Roughness values were not given). They also stated that the film thickness and hence growth rate increased.…”
Section: Tco Thin Film Analysismentioning
confidence: 95%
“…Thus, it is essential to develop ways for controlling their structure and surface properties. There are several techniques that have been used to prepare FTO nanoparticles and thin films such as chemical vapor deposition [17], hydrothermal [18], solvothermal [19], spray pyrolysis [20] sol-gel [21] and rf-magnetron sputtering [10]. Among these techniques, the sol-gel method attracts most of the attention to the preparation of oxide nanoparticles, with a high quality, because of its several advantages, such as excellent homogeneity, ease of controlling the doping level, ability to coat large areas, complex shapes, and low-cost processing [22].…”
Section: Introductionmentioning
confidence: 99%
“…As the substrate temperature increased to 300°C, the SnO 2 crystallites grew larger, and interconnections were well established. As demonstrated visually by the compacted particles and reduced porosity in Figure 4b, electronic transfer among particles became easier, and resistivity was reduced significantly (Zhao et al, 2008). At 350°C, large particles had less pores, as shown in Figure 4c, and further decreases in resistivity were obtained (2.1510 -5 Ω.cm).…”
Section: Substrate Temperature Variationmentioning
confidence: 79%
“…Additionally, the thickness of the film increased to 2.38 μm. As demonstrated visually by the compacted particles and reduced porosity in Figure 1b, the electronic transfer among particles became easier, and resistivity reduced significantly (Zhao et al, 2008). At a deposition time of 30 minutes, the particles were significantly larger with less pores, as shown in Figure 1c, and reduced resistivity was obtained, although the order of its value was the same as that at 20 minutes.…”
Section: Deposition Time Variationmentioning
confidence: 84%